2007
DOI: 10.1016/j.electacta.2006.09.021
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Bulk and surface micromachined MEMS in thin film SOI technology

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Cited by 16 publications
(5 citation statements)
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“…2b). When two different materials are consecutively deposited to form a linear beam in microfabrication processes, strain mismatch across the layers causes internal stresses that force the beam to bend out-of-plane after release, resulting in a spontaneous curvature κ s (refs 8, 23, 24). When the same process is used to fabricate a bilayered ring of radius R (before release), the release adds a supplementary curvature κ s perpendicular to the original one (1/ R ), which amounts to overcurve the ring with a pre-set overcurvature (Supplementary Methods; Supplementary Fig.…”
Section: Resultsmentioning
confidence: 99%
“…2b). When two different materials are consecutively deposited to form a linear beam in microfabrication processes, strain mismatch across the layers causes internal stresses that force the beam to bend out-of-plane after release, resulting in a spontaneous curvature κ s (refs 8, 23, 24). When the same process is used to fabricate a bilayered ring of radius R (before release), the release adds a supplementary curvature κ s perpendicular to the original one (1/ R ), which amounts to overcurve the ring with a pre-set overcurvature (Supplementary Methods; Supplementary Fig.…”
Section: Resultsmentioning
confidence: 99%
“…These testing stages are amenable to in situ TEM characterization by performing the back etching of the wafer under the test specimen, see [354] and also [356,357] for applications to fatigue analysis. A MEMS based testing frame based on a concept of ''on chip'' actuation of elementary tensile testing structures through internal stress has recently been developed and applied to different deformation and fracture investigations of freestanding metallic thin films [358][359][360][361][362]. This method schematically depicted in Fig.…”
Section: Fracture Testing Methods Of Freestanding Specimensmentioning
confidence: 99%
“…As thin films are deposited on substrate surfaces either by physical or chemical vapour deposition techniques, intrinsic stresses are likely to build inside the film. If the surface onto which the film adheres were to be removed, intrinsic stresses inside the film would cause either shrinkage (if stress is tensile) or elongation (if stress is compressive) of the released film [11][12][13][14][15]. The actual deposition method and experimental factors such as temperature, pressure, and gas chemistry are effective in determining the type and magnitude of film stress.…”
Section: Concept Of Intrinsic Stress-induced Self-assemblymentioning
confidence: 99%