2012
DOI: 10.1063/1.4766729
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Buried anti resonant reflecting optical waveguide based on porous silicon material for an integrated Mach Zehnder structure

Abstract: A buried anti resonant reflecting optical waveguide for an integrated Mach Zehnder structure based on porous silicon material is achieved using a classical photolithography process. Three distinct porous silicon layers are then elaborated in a single step, by varying the porosity (thus the refractive index) and the thickness while respecting the anti-resonance conditions. Simulations and experimental results clearly show the antiresonant character of the buried waveguides. Significant variation of the reflecta… Show more

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Cited by 8 publications
(2 citation statements)
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“…Other optical structures have been developed with both lateral and vertical confinement using photolithography processes [20,21] or a direct laser writing method [22]; for example, buried waveguides have been used to fabricate integrated Mach-Zehnder interferometers for sensing applications [23,24]. Recently, the first single side coupled micro-ring resonator based on PS [25] has been fabricated using standard electron beam lithography and reactive ion etching.…”
Section: Introductionmentioning
confidence: 99%
“…Other optical structures have been developed with both lateral and vertical confinement using photolithography processes [20,21] or a direct laser writing method [22]; for example, buried waveguides have been used to fabricate integrated Mach-Zehnder interferometers for sensing applications [23,24]. Recently, the first single side coupled micro-ring resonator based on PS [25] has been fabricated using standard electron beam lithography and reactive ion etching.…”
Section: Introductionmentioning
confidence: 99%
“…However waveguides that confine light in two dimensions require some transverse confinement structure in addition to a planar dielectric stack. Techniques to incorporate transverse confinement include lithographic patterning and dry etching of multi layers [23], masking of the crystalline silicon substrate prior to electrochemical etching [24][25][26], direct laser oxidation of the surrounding regions, as we use here [27,28].…”
Section: Introductionmentioning
confidence: 99%