1998
DOI: 10.1021/ja9740531
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C−F Bond Cleavage by Mass-Selected Free Radicals at Fluorinated Self-Assembled Monolayer Surfaces

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Cited by 13 publications
(29 citation statements)
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“…Figure 4 presents the scattered ion mass spectrum recorded upon collision of 187 Re with the fluorocarbon SAM. Many features are similar to the W Á data, but the fluorocarbon abstraction products, ReCF Á , ReCF 2 and ReCF 3 Á are now of comparable abundance to the fluorine abstraction products. It is apparent that high collision energy favors Re-C bond formation over Re-F formation.…”
Section: Resultssupporting
confidence: 56%
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“…Figure 4 presents the scattered ion mass spectrum recorded upon collision of 187 Re with the fluorocarbon SAM. Many features are similar to the W Á data, but the fluorocarbon abstraction products, ReCF Á , ReCF 2 and ReCF 3 Á are now of comparable abundance to the fluorine abstraction products. It is apparent that high collision energy favors Re-C bond formation over Re-F formation.…”
Section: Resultssupporting
confidence: 56%
“…The reaction thermochemical data for the formation of CrF x (x = 1-3) have been estimated 27 and are displayed in Table 1. As one can see, the formation of CrF 3 is highly endothermic, and this result emphasizes the control of thermochemistry over ion/surface reactions. Figure 2 shows the scattered ion mass spectra recorded upon collision of 98 Mo Á at the fluorocarbon SAM at 90 eV collision energy, as well as an energy resolved mass spectrum (ERMS) plot for collision energies ranging from 20 to 190eV.…”
Section: Resultsmentioning
confidence: 92%
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“…The use of energetic free radicals to e †ect CÈF bond cleavage in Ñuorocarbons in surface reactions has also been reported. 38 This paper focuses on the reactions of silyl cations with Ñuorocarbon surfaces, the associated phenomenon of multiple CÈF bond cleavage and the potential of using the gas-phase polyatomic ions (n \ 3, Si(NCO) n4 ) and as chemical reagents to modify Ñu-ClC(CN) 2ò rocarbon surfaces selectively. Halogen-or pseudohalogen transfer reactions are exploited to introduce functional groups into the F-SAM surfaces.…”
mentioning
confidence: 99%