“…Similarly, Figure 3 shows the change in the distributed inductance, L(), as a function of frequency. It is observed that the values of the inductance and resistance per unit length, calculated from the new formulas, are found to be in good agreement with those of [2,6] (full-wave quasi-TEM technique and CAD-oriented circuit modeling approach). The agreement is excellent over the entire frequency range of 0.2-10 GHz.…”
Section: New Frequency-dependent Series Impedance Expressionsupporting
“…Similarly, Figure 3 shows the change in the distributed inductance, L(), as a function of frequency. It is observed that the values of the inductance and resistance per unit length, calculated from the new formulas, are found to be in good agreement with those of [2,6] (full-wave quasi-TEM technique and CAD-oriented circuit modeling approach). The agreement is excellent over the entire frequency range of 0.2-10 GHz.…”
Section: New Frequency-dependent Series Impedance Expressionsupporting
“…To incorporate the effects, the more general solution is to modify the simulator as proposed by Chang [27]. The frequency-dependent effects can also be approximated with an equivalent model as shown by Deutsch [21], Krauter [33], Yue [34], and Zheng [35]. An RC network to model the frequency-dependent shunt component was used in [23].…”
Section: Transient Analysis With Extracted Parametersmentioning
“…Depending on its geometry, a CMOS interconnection can be approximated as a metalinsulator-semiconductor (MIS) transmission line or [2,3] as a coplanar waveguide (CPW) on a semiconductor substrate [4,5]. The first model can be applied when the ground return is provided by the semiconductor substrate, while the second model better describes the situation Contract/grant sponsor: IMM-LAMEL Institute of the Italian National Research Council (CNR) of a signal trace embedded between two coplanar ground lines, typically encountered in highspeed digital interconnections.…”
SUMMARYThis paper illustrates the application of a lumped element-finite difference time domain (LE-FDTD) simulator to the wide-band modelling of CMOS interconnections. To achieve very accurate results the short-open calibration (SOC) technique has been adopted. Specific parameters of a CMOS interconnection laterally screened by a stack of metal vias have been extracted in the two cases of an unperturbed and a purposely damaged metal line. The behaviour of void-like defects in the metal line has been also studied using the fully three-dimensional capabilities of the simulator. It has been demonstrated that, at least in the simulated cases, only the specific resistance is affected by damaging.
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