2001
DOI: 10.1016/s0584-8547(01)00297-x
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Calibration of straight total reflection X-ray fluorescence spectrometry — results of a European Round Robin test

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Cited by 13 publications
(10 citation statements)
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“…However, other methods may be used if they yield equivalent results to the reference methods. Due to continued research and development [22], Total Reflection X-Ray Fluorescence analysis TXRF has become a well-accepted chemical technique for quality control in the semiconductor industry [23]. The reflection of X-Rays close to the critical angle makes this technique extremely sensitive with improvements in limits of detection.…”
Section: Introductionmentioning
confidence: 99%
“…However, other methods may be used if they yield equivalent results to the reference methods. Due to continued research and development [22], Total Reflection X-Ray Fluorescence analysis TXRF has become a well-accepted chemical technique for quality control in the semiconductor industry [23]. The reflection of X-Rays close to the critical angle makes this technique extremely sensitive with improvements in limits of detection.…”
Section: Introductionmentioning
confidence: 99%
“…7. Calibration of TXRF: measured and calculated angular dependency of (a) a droplet residue standard (after Knoth et al [75]) versus, (b) a spin-coated standard (after Rink et al [84]), (c) a bulk type standard (after Knoth et al [75] Advantages of using a film type calibration sample are in:…”
Section: Calibration Using a Film Type Standard Samplementioning
confidence: 99%
“…Theoretically it is assumed that the film thickness is constant and ≤ 1 nm that results in the same angular dependence under all conditions. In practice however, the film thickness can be thicker [84]. It has been shown in a round robin test that these issues with e.g.…”
Section: Calibration Using a Film Type Standard Samplementioning
confidence: 99%
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“…Over several years, total reflection X‐ray fluorescence (TXRF) spectroscopy has become known as a versatile tool for elemental analysis across many application fields . TXRF is an advanced technique for surface chemical analysis which, within ISO, was originally applied to measure and control the contamination of silicon wafers to support the semiconductor industry . It was then further exploited in other application fields where there was a demand for measuring low mass volumes where the sample was then deposited onto X‐ray reflective surfaces.…”
Section: Introductionmentioning
confidence: 99%