Calibration strategies for precision stages in state-of-the-art registration metrology

Huebel, Alexander; Schellhorn, U.; Arnz, M.; Klose, Gerd; Beyer, Dirk

doi:10.1117/12.824281

Cited by 9 publications

(3 citation statements)

References 4 publications

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“…The community was introduced to the main tool concepts such as the design of the optical beam path, expected imaging performance, and stage calibration concepts [1][2][3][4][5][6]. PROVE TM as a strategic project currently running at Carl Zeiss combines knowledge and expertise from various departments within Carl Zeiss SMT as well as external partners, M+W Group (environmental control) and HAP Dresden (handling system), both located in Germany.…”

Section: System Descriptionmentioning

confidence: 99%

PROVE, the next generation registration metrology tool: status report

Beyer

Gabella²,

Hughes³

et al. 2010

SPIE Proceedings

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SEMATECH has identified the need for a high resolution photomask pattern placement metrology tool to support SEMATECH member companies' photomask production as well as research and development work. Performance measures of the tool are driven by double exposure/double patterning approaches that will help extend 193nm lithography according to International Technology Roadmap for Semiconductors (ITRS) requirements. Based on its superior and extendable concept, PROVE TM , a new photomask registration and overlay metrology system from Carl Zeiss SMS, was chosen as the winning proposal for tool development by an evaluation team of mask makers and SEMATECH member companies. The scope of the PROVE TM project is to design and build a photomask pattern placement metrology tool to serve the 32 nm node and below. The tool is designed for 193 nm illumination and imaging optics, which enable at-wavelength metrology for current photomask needs. The optical beam path offers registration and critical dimension (CD) metrology using transmitted or reflected light. The short wavelength together with an NA of 0.6 also allows sufficient resolution even at working distances compatible with the use of pellicles, hence enabling the tool for qualification of final masks. The open concept together with the use of 193 nm wavelength enables a higher NA for pellicle-free applications, including extreme ultraviolet (EUV) masks. This paper reports the current status of PROVE TM , highlighting its resolution capabilities while measuring production features as well as key registration specifications.

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Section: System Descriptionmentioning

confidence: 99%

PROVE, the next generation registration metrology tool: status report

Beyer

Gabella²,

Hughes³

et al. 2010

SPIE Proceedings

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“…It requires high resolution capabilities combined with excellent reproducibility and accuracy. For PROVE TM [8,9,10,11], the next generation photomask registration and overlay metrology system currently under development at Carl Zeiss we have chosen a diffraction limited, high resolution optics operating at 193 nm. The tool offers measurements both in transmission and reflection, while providing variable illumination for maximum contrast imaging.…”

Section: Registration Metrologymentioning

confidence: 99%

In-die metrology on photomasks for low k 1 lithography

2009

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New lithography techniques like Double Patterning, Computational Lithography and Source Mask Optimization will be used to drive immersion lithography to its limits. This results in several challenges for the mask maker. The extremely high MEEF values amplify small process variations on the mask features on the wafer. Complex mask features using sophisticated OPC and assist features as well as double patterning tightens the registration and CDU specification at the same time. Especially, overlay becomes more and more critical and must be ensured on every die. In-die registration and CD metrology on arbitrary features is required to measure mask performance precisely.In this paper an overview about several in-die metrology techniques will be given. Application of in-die CD measurements using the Zeiss WLCD32 tool as well as in-die registration measurements using the Zeiss Prove tool will be shown and discussed.

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“…PROVE TM [2][3][4][5], the registration metrology tool offered by Carl Zeiss, addresses these needs by using 193nm illumination together with a high-precision stage and new image analyses schemes. In order to take full advantage of the new features, Carl Zeiss has entered into a close cooperation with Synopsys.…”

Section: Introductionmentioning

confidence: 99%

In-die job automation for PROVE

et al. 2011

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The increasing demands for registration metrology for repeatability, accuracy, and resolution in order to be able to perform measurements in the active area on production features have prompted the development of PROVE TM , the nextgeneration registration metrology tool that utilizes 193nm illumination and a metrology stage that is actively controlled in all six degrees of freedom. PROVE TM addresses full in-die capability for double patterning lithography and sophisticated inverse -lithography schemes. Innovative approaches for image analysis, such as 2D correlation, have been developed to achieve this demanding goal.In order to take full advantage of the PROVE TM resolution and measurement capabilities, a direct link to the mask data preparation for job automation and marker identification is inevitable. This paper describes an integrated solution using Synopsys' CATS ® for extracting and preparing tool-specific job input data for PROVE. In addition to the standard marking functionalities, CATS ® supports the 2D correlation method by providing reference clips in OASIS.MASK format.

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Calibration strategies for precision stages in state-of-the-art registration metrology

Cited by 9 publications

References 4 publications

PROVE, the next generation registration metrology tool: status report

PROVE, the next generation registration metrology tool: status report

In-die metrology on photomasks for low k 1 lithography

In-die job automation for PROVE

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