Capacitive electrical asymmetry effect in an inductively coupled plasma reactor

Zhang, Quan‐Zhi; Bogaerts, Annemie

doi:10.1088/1361-6595/aad796

Cited by 4 publications

(3 citation statements)

References 35 publications

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“…Based on the preceding assumptions, the field equations were derived through the direct summation and extrapolation of the particle motion equations. A standard MCC procedure was used [37][38][39][40][41][42][43][44] to calculate collisions, and the cross sections used in this study were adopted from references [37][38][39][40]. Because SEE is inevitable in gas discharge, the PIC-MCC model was self-consistently coupled with different emission models, including thermionic and SEE models, field and SEE models, and thermo-field and SEE models.…”

Section: Pic-mcc Simulation Resultsmentioning

confidence: 99%

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

SUN 孙,

DAI 代,

XU 徐

et al. 2024

Plasma Sci. Technol.

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Electrons can escape from the cathode surface by acquiring enough energy greater than the work function or weakening the potential barrier at the cathode surface through tunneling effects in gas discharges, which plays a dominant role in the plasma-cathode interactions and is a key factor in many plasma phenomena and industrial applications. It is necessary to illustrate the various electron emission mechanisms and corresponding applicable description models to evaluate the impacts on discharge properties, especially for numerical simulation studies. However, most current researches usually rely on previous experience to select the appropriate simplified formula to calculate the electron emission current density, and there is little work that can explicitly give the application range of the simplified formulas for describing electron emission. In this work, the detailed expressions of the simplified formulas valid for field emission to thermo-field emission to thermionic emission typically used in the numerical simulation are proposed, and corresponding application ranges are determined in the framework of the Murphy-Good theory, which is commonly regarded as the general model and to be accurate in the full range of conditions of validity of the theory. The dimensionless parametrization is used to evaluate the emission current density of the Murphy-Good formula and a deviation factor is defined to obtain the application ranges for different work functions (2.5~5 eV), different cathode temperatures (300~6000 K), and different emitted electric field (105 ~1010 V‧m-1). The deviation factor is shown to be a non-monotonic function of the three parameters. A comparative study of particle number densities in atmospheric gas discharge with tungsten cathode is performed based on the one-dimensional implicit particle-in-cell with the Monte Carlo Collision (PIC-MCC) method according to the above application ranges. It is found that small differences in emission current density can lead to variation in the distributions of particle number density due to the change of collisional environment. This present work can provide a theoretical basis to select emission models for the subsequent numerical simulation.

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Section: Pic-mcc Simulation Resultsmentioning

confidence: 99%

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

SUN 孙,

DAI 代,

XU 徐

et al. 2024

Plasma Sci. Technol.

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“…However, the investigation of the EAE in ICPs is very limited. Although Zhang and Bogaerts has already studied the EAE in inductively coupled C 4 F 8 /SF 6 plasmas and obtained similar conclusions as in CCPs [4], the effectiveness of the EAE on the independent modulation of the ion flux and ion energy in ICPs under various discharge conditions is not fully proved. Furthermore, the EAE is mainly investigated in electropositive or weakly electronegative CCPs, such as Ar, H 2 , H 2 /SiH 4 and O 2 discharges [35,[41][42][43][44][45][46][47][48], and the studies in strongly electronegative gases, such as Cl 2 , are rarely reported.…”

Section: Introductionmentioning

confidence: 98%

“…potential and thus the ion bombarding energy on the bottom electrode in ICPs is normally quite low, i.e. with maximum energy in the range between 20 eV and 40 eV, which limits the plasma processing efficiency [1,3,4]. Therefore, an idea of capacitive/inductive hybrid discharge is proposed, in which the plasma density and ion bombarding energy are controlled independently by the ICP power and capacitive bias power, respectively [1,[5][6][7][8].…”

Section: Introductionmentioning

confidence: 99%

Investigation of the dual-frequency bias effect on inductively coupled Cl₂ plasmas by hybrid simulation

Tong

Zhao

Zhang

et al. 2023

J. Phys. D: Appl. Phys.

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In the etching process, a bias source is usually applied to the bottom electrode in inductively coupled plasmas (ICPs) to achieve independent control of the ion flux and ion energy. In this work, a hybrid model, which consists of a global model combined bi-directionally with a fluid sheath model, is employed to investigate the dual-frequency (DF) bias effect on the inductively coupled Cl2plasmas under different pressures. The results indicate that the DC self-bias voltage developed on the biased electrode is approximately a linear function of the phase shift between the fundamental frequency and its second harmonic, and the value only varies slightly with pressure. Therefore, the ion energy on the bottom electrode can be modulated efficiently by the bias voltage waveform, i.e., the fluctuation of the ion energy with phase shift is about 40% for all pressures investigated. Besides, the ion energy and angular distribution functions (IEADFs) in DF biased inductive discharges is complicated, i.e., the IEADFs exhibits a four-peak structure under certain phase shift values. Although the species densities and ion fluxes also evolve with phase shift, the fluctuations are less obvious, especially for Cl2+ ions at low pressure. In conclusion, the independent control of the ion energy and ion flux are realized in DF biased ICPs, and the results obtained in this work are of significant importance for improving the etching process.

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ICP argon discharge simulation: The role of ion inertia and additional RF bias

Kropotkin

Voloshin

2020

Physics of Plasmas

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Inductively coupled plasma (ICP) argon discharge with additional RF bias on the electrode is studied numerically and compared with experimental data. The role of ion inertia is shown by comparing the two numerical approaches: drift-diffusion approximation and a separate equation for ion momentum in the model. Two different discharge geometries are studied: simple cylindrical geometry and two chambers geometry with a downstream plasma. The difference in the calculated plasma density is shown for lower pressure values. Two approaches give similar results at a pressure of 100 mTorr. The downstream ICP discharge with an additional 12 MHz bias was calculated for the range of voltage amplitude from 20 to 215 V. The ion energy distribution function at the RF-biased electrode is calculated by the kinetic model. The results are compared with experimentally measured plasma density and ion energy spectra in the two-chamber discharge geometry. A good agreement was obtained between the calculated and experimental data.

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Capacitive electrical asymmetry effect in an inductively coupled plasma reactor

Cited by 4 publications

References 35 publications

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

Investigation of the dual-frequency bias effect on inductively coupled Cl₂ plasmas by hybrid simulation

ICP argon discharge simulation: The role of ion inertia and additional RF bias

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Capacitive electrical asymmetry effect in an inductively coupled plasma reactor

Cited by 4 publications

References 35 publications

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

Analysis of application range of simplified models for field to thermo-field to thermionic emission processes from the cathode

Investigation of the dual-frequency bias effect on inductively coupled Cl2 plasmas by hybrid simulation

ICP argon discharge simulation: The role of ion inertia and additional RF bias

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Investigation of the dual-frequency bias effect on inductively coupled Cl₂ plasmas by hybrid simulation