By means of deep level transient spectroscopy (DLTS) a dislocation-related deep-level trap has been revealed in partially strain-relaxed InGaAs/GaAs heterostructures, grown by MOVPE. On the basis of the specific criteria containing DLTS-line shape and behaviour analysis as well as capture kinetics measurements, we were able to attribute the trap to "localized" states at the dislocation core or close to it. A direct comparison of DLTS concentration profiles and TEM results enable us to attribute the electron trap to 60° misfit dislocations lying at the heterostructure interface.