Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography

Abstract

The use of purified carbon dioxide (CO 2 ) has become a reality for leading edge 193 nm immersion lithography scanners. Traditionally, both dry and immersion 193 nm lithographic processes have constantly purged the optics stack with ultrahigh purity compressed dry air (UHPCDA). CO 2 has been utilized for a similar purpose as UHPCDA. Airborne molecular contamniation (AMC) purification technologies and analytical measurement methods have been extensively developed to support the Lithography Tool Manufacturers purity requirements. This paper covers the analytical tests and characterizations carried out to assess impurity removal from 3.0 N CO 2 (beverage grade) for its final utilization in 193 nm and EUV scanners.