Carbon dioxide sorption in conventional and plasma polymerized methyl methacrylate thin films

Zhang, C.; Wyatt, J. R.; Weinkauf, D. H.

doi:10.1016/j.polymer.2004.08.054

Cited by 45 publications

(32 citation statements)

References 18 publications

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“…Based on these detailed FTIR analyses, the retention of the functional groups is clearly evident in the high-flow sample. Compared to plasma films deposited from MMA [6,8,11,12,37±39] based on FTIR results, the high-flow iCVD sample in this work exemplifies much more structural resemblance to conventional PMMA than the plasma samples. FTIR studies of plasma films have shown broadened peaks, [8,11,38] diminished C=O peaks, [8,39] and weakened C±O and C±H peaks.…”

Section: Resultsmentioning

confidence: 94%

“…Poly(methyl methacrylate) (PMMA) thin films are of great interest because of their wide variety of uses in coatings, [1,2] membranes, [1±4] relative-humidity sensing, [5] solidstate dye layers, [6] gas and organic-vapor sensing, [4,7,8] dielectric sacrificial layers, [1,2,9] electron-beam lithography, [10±13] and photonic applications. [6,14,15] There are many advantages of using a dry process such as CVD to produce polymer thin films.…”

Section: Introductionmentioning

confidence: 99%

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Initiated CVD of Poly(methyl methacrylate) Thin Films

Chan

Gleason

2005

Chem. Vap. Deposition

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Initiated CVD (iCVD), a dry method, is able to produce poly(methyl methacrylate) (PMMA) thin films by utilizing a reactive gaseous mixture of the monomer methyl methacrylate and the initiator triethylamine. The deposition rate is twenty times faster with the use of the initiator. Fourier-transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) show high structural resemblance between iCVD PMMA and conventional PMMA, and the degree of functionality retention increases with decreasing residence time in the vacuum chamber. XPS detection of nitrogen incorporation is consistent with the incorporation of the initiator into the polymer chains. NMR spectroscopy on completely dissolved films shows that the tacticity of iCVD PMMA resembles that of conventional, radically polymerized PMMA. Altogether these observations support the hypothesis that, for iCVD PMMA, the polymerization is by a free-radical mechanism.

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Section: Resultsmentioning

confidence: 94%

Section: Introductionmentioning

confidence: 99%

Initiated CVD of Poly(methyl methacrylate) Thin Films

Chan

Gleason

2005

Chem. Vap. Deposition

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“…[2,3,6,15,16] These films also show very broad O-H stretching centered near 3400 cm -1 that, combined with the broad carbonyl peak, is more representative of poly(carboxylic acid) than PMMA. Conversion of the methoxy ester to carboxylic acid is possible via scission of the C-OCH 3 bond, creating a radical site which can then react with water in the deposition chamber or upon exposure to air to form the -COOH moiety.…”

Section: Ftir Spectroscopy To Determine the Optimal W/fmmentioning

confidence: 96%

“…[15] Zhang et al note 'comparatively weak and broader' characteristic peaks as compared to PMMA, and significant decreased intensity of the C=O peak along with some broadening attributed to conversion of the ester to carboxylic acid. [3] a.…”

Section: Ftir Spectroscopy To Determine the Optimal W/fmmentioning

confidence: 99%

“…[11] Thin films of PMMA have been created using spin-on, [1,12] laser-assisted vapor deposition, [13] and PECVD. [3][4][5][6][7]11,[14][15][16][17][18] Utilizing its clean and nearly complete thermal degradation, and its properties as an e-beam resist, PMMA has the potential to be a directly patternable sacrificial material for fabrication of closed cavity, air-gap structures which have applications in photonics and in semiconductor devices as an ultra low-k dielectric. This work examines the structure of films deposited under continuous wave (CW) and pulsed plasma-enhanced (PPE) CVD from MMA monomer under various processing conditions.…”

Section: Introductionmentioning

confidence: 99%

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Effect of Substrate Temperature on the Plasma Polymerization of Poly(methyl methacrylate)

Casserly¹,

Gleason²

2006

Chemical Vapor Deposition

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Low-power, plasma-enhanced (PE)CVD together with polymerization of methyl methacrylate (MMA) can be used to deposit thin films of poly(methyl methacrylate) (PMMA) with minimal loss of functional groups, as shown by Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and Raman spectrometry (RS). Retention of functional groups decreases with increased substrate temperature, corresponding to decreased deposition rates. From XPS data, the calculated percentage loss of functional groups ranges from 0.9 % to 43.4 %, changing as a function of deposition conditions. RS confirms the presence of C=C bonds in the polymer backbone as a result of scission of the ester group from MMA. The thermal properties of PECVD-produced films from MMA can be tailored by varying the substrate temperature. Onset of thermal decomposition increases with increased substrate temperature by eliminating thermally labile peroxide linkages in the polymer backbone, and by crosslinking that occurs at radical sites generated via scission of functional group bonds. The post-anneal thicknesses of the remaining polymer is of the order of 4 nm or less, indicating that low-power PECVD of PMMA is a viable candidate to act as a sacrificial material for air-gap fabrication.

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Dielectric barrier discharge plasma induced surface modification of polyester/cotton blended fabrics to impart water repellency using HMDSO

Palaskar

Kale

Nadiger

et al. 2011

J of Applied Polymer Sci

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Continuous treatment of polyester/cotton blended fabric samples was carried with hexamethyldisiloxane (HMDSO) plasma on the pilot scale atmospheric pressure plasma reactor. The mixture of helium and argon was used as carrier gas for generating dielectric barrier discharge plasma. The effect of discharge power and treatment time on the water repellent properties of samples were evaluated with contact angle (CA) and spray test measurements. Spray test and CA results showed improved resistance to wetting with water. The effect of discharge conditions on the surface morphology and surface chemistry of plasma treated samples were investigated by scanning electron microscopy (SEM) and Fourier transform infrared (FTIR) spectroscopic analysis, respectively. The presence of Si-O-Si and Si-CH 3 groups in the structure of plasma polymer deposited at the surface of P/C samples was revealed by FTIR spectroscopy. Further, structural differences in HMDSO plasma polymer deposited under different discharge conditions were reported with reference to organic/inorganic nature of plasma polymer.

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Carbon dioxide sorption in conventional and plasma polymerized methyl methacrylate thin films

Cited by 45 publications

References 18 publications

Initiated CVD of Poly(methyl methacrylate) Thin Films

Initiated CVD of Poly(methyl methacrylate) Thin Films

Effect of Substrate Temperature on the Plasma Polymerization of Poly(methyl methacrylate)

Dielectric barrier discharge plasma induced surface modification of polyester/cotton blended fabrics to impart water repellency using HMDSO

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