Carbon Film Deposition with ns Lasers

Schultrich, B.

doi:10.1007/978-3-662-55927-7_15

Tetrahedrally Bonded Amorphous Carbon Films I

2018

DOI: 10.1007/978-3-662-55927-7_15

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Carbon Film Deposition with ns Lasers

B. Schultrich

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2021

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Modification of a silicon surface visible light reflectivity by the carbon nanofilm

Dabaghyan

2021

Int. J. Mod. Phys. B

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Crystalline silicon substrate visible light reflectivity is finely modified by a discrete growth of carbon nanofilm (CNF) on it by nanosecond pulsed laser deposition (PLD) technique. It is established that 71 nm thick CNF effectively reduces the high reflection of the substrate on average to 5% in the visible light wave range. The exact values of the thickness and refractive index of the carbon nanofilm are also determined via an analysis of reflection spectra.

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Modification of a silicon surface visible light reflectivity by the carbon nanofilm

Dabaghyan

2021

Int. J. Mod. Phys. B

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Carbon Film Deposition with ns Lasers

Cited by 1 publication

References 50 publications

Modification of a silicon surface visible light reflectivity by the carbon nanofilm

Modification of a silicon surface visible light reflectivity by the carbon nanofilm

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