Encyclopedia of Nanotechnology 2015
DOI: 10.1007/978-94-007-6178-0_101022-1
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Carbon MEMS

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(2 citation statements)
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“…Typical 2.5D structures are arrays of pillars with various cross-sections. [38,43,48] The height of such pillars ranges from a few micrometers to 100 mm. However, multistep photolithography prior to the pyrolysis step leads to even taller carbon pillars.…”
Section: Carbon Microelectromechanical System (C-mems)mentioning
confidence: 99%
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“…Typical 2.5D structures are arrays of pillars with various cross-sections. [38,43,48] The height of such pillars ranges from a few micrometers to 100 mm. However, multistep photolithography prior to the pyrolysis step leads to even taller carbon pillars.…”
Section: Carbon Microelectromechanical System (C-mems)mentioning
confidence: 99%
“…The classical route for C‐MEMS relies on the patterning of an epoxy photoresist using UV photolithography followed by carbonization in an inert atmosphere. [ 43 ] Photolithography is the main process in microelectronics and microelectromechanical systems (MEMS) technologies and refers to the patterning of a polymer using light. Therefore, UV light is typically projected through a shadow mask onto an uncured resin layer.…”
Section: Additive Micro/nano‐manufacturing Processes For Carbonmentioning
confidence: 99%