2013
DOI: 10.1016/j.vacuum.2012.08.004
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Carbon monoxide dissociation to oxidation surface reaction pathway shift on Mo(110) upon alloying with boron

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Cited by 7 publications
(6 citation statements)
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“…At the same time, due to the specific electronic properties of half-filled d-band, and the excess of free charge in such a metal like Al, the d-sp hybridization would shift the center of the d-band down with respect to Fermi level, thus increasing its filling and, as a consequence, enhancing catalytic activity [ 9 ]. In line with this assumption are the previous results of increase in CO catalytic oxidation activity on Mo(110) upon alloying with boron, the element which is isoelectronic to Al [ 12 ].…”
Section: Introductionsupporting
confidence: 68%
“…At the same time, due to the specific electronic properties of half-filled d-band, and the excess of free charge in such a metal like Al, the d-sp hybridization would shift the center of the d-band down with respect to Fermi level, thus increasing its filling and, as a consequence, enhancing catalytic activity [ 9 ]. In line with this assumption are the previous results of increase in CO catalytic oxidation activity on Mo(110) upon alloying with boron, the element which is isoelectronic to Al [ 12 ].…”
Section: Introductionsupporting
confidence: 68%
“…In line with the trend of modification of metals with boron, Tvauri et al [ 7 ] by Surface Science techniques demonstrated that the alloying of Mo(110) substrate with boron dramatically shifts the CO dissociation pathway on bare Mo(110) to oxidation (CO + 1/2O 2 →CO 2 ) at the borided Mo(110). It is concluded that this is due to d-band filling of Mo upon alloying with boron via d←p hybridization on one hand, and reconstruction of the surface with exposing the newly formed active adsorption/reaction sites to the gas phase on the other.…”
Section: Introductionmentioning
confidence: 76%
“…A comparison of the boron LEIS intensities before (spectrum 2) and after (spectrum 3) annealing indicates that the fraction of B atoms remaining at the outermost layer of the system after annealing is about 1/3 of the monolayer concentration. As has been noted above, the obtained system corresponds to quite stable molybdenum boride [ 7 ].…”
Section: Resultsmentioning
confidence: 98%
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