2011
DOI: 10.1016/j.carbon.2011.05.041
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Carbon nanotube–carbon nanotube contacts as an alternative towards low resistance horizontal interconnects

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Cited by 30 publications
(20 citation statements)
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“…Additionally, the presence of metallic and semiconducting CNTs causes a Schottky barrier, which greatly suppresses the electrical transport in CNT networks [21]. Lack of efficient transport pathways due to the weak van der Waals contacts of CNTs, may significantly increase the overall film resistance by a factor as high as 10 [22,23].…”
Section: Introductionmentioning
confidence: 99%
“…Additionally, the presence of metallic and semiconducting CNTs causes a Schottky barrier, which greatly suppresses the electrical transport in CNT networks [21]. Lack of efficient transport pathways due to the weak van der Waals contacts of CNTs, may significantly increase the overall film resistance by a factor as high as 10 [22,23].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, Santini et al found that the contact resistance in a MWCNT/MWCNT contact was always below the MWCNT/metal contact resistance for all the different nanotube diameters tested, therefore showing great potential to be used as horizontal interconnects. [35] The transfer mechanisms involved in the process at the interface are still a topic of discussion within the community. There are approaches in which a single CNT is contacted by metal oxides at either end, building a transistor.…”
Section: Resultsmentioning
confidence: 99%
“…In the side contact configuration, the CNT side wall is physisorbed to a metal, 6 while in the end contact configuration, an open end of the CNT directly bonds to the metal. 7 In this work, focus is placed on the end contact configuration, whereby the open end of a CNT is chemically bonded to a metal surface. The metal used in the contact can determine whether an Ohmic (linear current-voltage (IV) relationship) or Schottky (rectifying current-voltage characteristic) contact is formed.…”
Section: Formation Of Contacts Between Doped Carbon Nanotubes and Alumentioning
confidence: 99%