Carbon nitride thin films prepared by a capacitively coupled RF plasma jet

Abstract

Carbon nitride thin films have been downstream deposited from a nitrogen plasma beam sustained by a capacitively coupled discharge generated between a RF powered carbon electrode and a grounded carbon nozzle. The spectral emission of the plasma jet strongly exhibits the CN radical emission indicating that the deposition takes place via a mechanism involving the CN radical. The deposition process is enhanced by DC biasing the powered electrode. The films have been investigated by X-ray diffraction, infrared absorption spectroscopy and X-ray photoelectron spectroscopy. The results show that the films are amorphous and contain in a large extent carbon nitrogen bonds.

Optical Spectroscopic Investigation of Ar/CH3OH and Ar/N2/CH3OH Atmospheric Pressure Plasma Jets

“…The relative intensities were obtained by normalizing the measured optical line intensities to that of Ar line at 696.5 nm. The spectral emission of CN radicals has been observed in the plasma jet, indicating that deposition takes place via a mechanism involving the CN radical [21] . Using methanol as carbon-based species, some spectra lines of carbonaceous species, such as C, CN, CH and C 2 , can be observed in plasma by OES.…”

Thermal evolution study of nonmetallic impurities and surface passivation of Cu nanopowders produced via a DC thermal plasma synthesis

“…The condensation is supposed to proceed via a chemisorption and polymerization mechanism of CN-species. Based on the GFA results for nitrogen and the TPO results for the chemically bound carbon, the N/C atomic ratio of the CNpassivated material was found to be in the range from 1.0 to 1.5, which compares favorably with a range of values reported for the plasma-deposited carbon nitrides [25,26]. The N-rich carbonaceous compounds exhibit relatively low thermal stability, which is substantially lower than that of the surface oxides on the Cu nanopowders.…”

“…The N-rich carbonaceous species are abundant in this material, and, along with the free carbon, are believed to contribute to the surface passivation. The production of cyano species upon chemical interaction of nitrogen discharge with graphite is a well-known phenomenon that has been utilized for the downstream deposition of carbon nitride coatings on bulk substrates [25,26]. The results of the present work suggest that the Cu aerosol nanoparticles can also serve as a substrate for the condensation of the N-rich carbonaceous species upon rapid quenching of the cyano-bearing plasma jet.…”

Ultra-high-rate deposition of diamond-like carbon films using Ar/C2H2 plasma jet CVD in combination with substrate-stage discharge

“…The plasma jet is a method of ejecting plasma in the form of a jet to reach the base material. [24][25][26] The DLC deposition rate is expected to improve with the use of a plasma jet consisting of C 2 H 2 , the carbon source for DLC, because the flux of the precursor for DLC increases close to the substrate. In addition, the application of an appropriate substrate-bias voltage improves the hardness of DLC films.…”