Carbon‐Rich Plasma‐Deposited Silicon Oxycarbonitride Films Derived from 4‐(Trimethylsilyl)morpholine as a Novel Single‐Source Precursor

Abstract

4‐(trimethylsilyl)morpholine O(CH 2CH 2) 2NSi(CH3) 3 (TMSM) was investigated as a single‐source precursor for SiCNO films synthesis. Optical emission spectroscopy of plasma generated from TMSM/He, TMSM/H 2, and TMSM/NH 3 gas mixtures revealed the presence of N 2, CH, H, CN, and CO species. The last two are suggested to be responsible for the lowering of carbon concentration in the films in comparison with the precursor. The refractive index ranged from 1.5 to 2.0, and bandgap varied from 2.0 to 4.6 eV, which pointed that some of the films can be used as antireflective coatings in silicon photovoltaic cell technologies and electronic devices.