2017
DOI: 10.1063/1.4983404
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Carrier density control and enhanced thermoelectric performance of Bi and Cu co-doped GeTe

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Cited by 37 publications
(31 citation statements)
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“…Figure 7a shows the reported manipulation range of n H by different methods. [94,95,99,101,151] The data points correspond to n H of pristine GeTe and the vertical line indicates the variation range of n H in these GeTe-based materials intentionally doped/alloyed with different elements. The corresponding n H values can be effectively decreased by substitutions of Group-V metals on Ge sites, and two representative examples can be found in Ge 1−x Sb x Te [95] and Ge 1−x Bi x Te.…”
Section: Manipulation Of the Carrier Concentrationmentioning
confidence: 99%
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“…Figure 7a shows the reported manipulation range of n H by different methods. [94,95,99,101,151] The data points correspond to n H of pristine GeTe and the vertical line indicates the variation range of n H in these GeTe-based materials intentionally doped/alloyed with different elements. The corresponding n H values can be effectively decreased by substitutions of Group-V metals on Ge sites, and two representative examples can be found in Ge 1−x Sb x Te [95] and Ge 1−x Bi x Te.…”
Section: Manipulation Of the Carrier Concentrationmentioning
confidence: 99%
“…[94] So far, the lowest obtained n H reaches 5.8  10 19 cm −3 in Ge 1−x−y Bi x Cu y Te, which was synthesized by melting, quenching, and spark-plasma-sintering annealing procedures to homogeneously dope a large amount of Bi and Cu into the GeTe lattice. [151] In addition to these aliovalent dopants, controlling the intrinsic Ge-vacancies can also decrease n H . As revealed in Figure 7b, Ge vacancies (V Ge ) has the lowest E form in contrast to those of the Te vacancies (V Te ) and antisite defects (Ge Te and Te Ge ) in pristine GeTe, which rationalizes the high holetype n H in GeTe.…”
Section: Manipulation Of the Carrier Concentrationmentioning
confidence: 99%
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“…The Bi and Sb have been widely used to reduce the hole concentration of GeTe due to their donor dopant nature. [ 29–33 ] Other doping or alloying with Pb, [ 25,34–36 ] Se, [ 30,37–39 ] Bi‐Sb, [ 40 ] Bi‐Cu, [ 41 ] Mn‐Bi, [ 42 ] Mn‐Sb, [ 43 ] Pb‐Sb, [ 28,44 ] Pb‐Bi, [ 45 ] Cd‐Bi, [ 46,47 ] Sb‐Zn, [ 48 ] Sb‐In, [ 49 ] Bi 2 Te 3 , [ 23,26 ] Sb 2 Te 3 , [ 50 ] and AgSbTe 2 [ 51,52 ] have also been widely applied to optimize the carrier density and to reduce κ lat for enhancing the ZT of GeTe‐based alloys. Combined with the synergic effects of carrier‐density optimization, band engineering and phonon engineering strategies, many GeTe‐based alloys with peak ZT of around 2 have been reported recently.…”
Section: Introductionmentioning
confidence: 99%