“…Third, InGaN QDs reduced the built-in piezoelectric polarization field and alleviated the QCSE. , Currently, there are several types of methods for obtaining InGaN QDs. Self-assembled epitaxy of InGaN QDs based on the Stranski–Kastranow (S–K) growth mode has been successfully achieved by both metal–organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). ,, However, this method had some drawbacks such as the relatively low QD density and inhomogeneous size distribution, which might broaden the photoluminescence (PL) spectrum and prolong the decay lifetime. , In addition, the strain field in the wetting layers from the S–K-grown QDs reduced the envelope function overlap and recombination rate in the active region . Selective-area epitaxy and site-controlled reactive ion etching were two alternative techniques for forming QDs with superior size control; however, the QD size density was restricted by the mask dimensions, and these QDs could be quite large (∼20 nm diameter). ,, Because of the relatively complex manufacturing or the high cost of the QD preparation method, the researchers tried to develop new ways to obtain small QD structures.…”