2015
DOI: 10.1021/cs501862h
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Catalyst Design with Atomic Layer Deposition

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Cited by 675 publications
(621 citation statements)
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References 240 publications
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“…Among various catalytic design techniques, [49] ALD has been extensively used to tune properties at the molecular level. [50] ALD allows deposition of thin layers (< 100 nm) with high level of conformality. In comparison, state-ofthe-art catalyst preparation methods that include wet impregnation and deposition precipitation can lead to a mixture of sites, which result in side reactions.…”
Section: Irreversible Deactivation Via Sintering And/or Leaching Of Smentioning
confidence: 99%
“…Among various catalytic design techniques, [49] ALD has been extensively used to tune properties at the molecular level. [50] ALD allows deposition of thin layers (< 100 nm) with high level of conformality. In comparison, state-ofthe-art catalyst preparation methods that include wet impregnation and deposition precipitation can lead to a mixture of sites, which result in side reactions.…”
Section: Irreversible Deactivation Via Sintering And/or Leaching Of Smentioning
confidence: 99%
“…Plasma catalysis is gaining increasing interest for various environmental applications, such as gaseous pollutant removal, the splitting of CO 2 , hydrogen generation and O 3 production [1][2][3][4][5][6][7][8][9]. Plasma catalysis can be regarded as the combination of a plasma with a catalyst, and often results in improved performance, in terms of selectivity and energy efficiency of the process.…”
Section: Introductionmentioning
confidence: 99%
“…Atomic layer deposition (ALD) originates from a modified version of metal-organic chemical vapor deposition that relies on the self-limiting chemistry of precursors and the interaction between substrates and precursors, and is able to meet the needs of atomic level control and conformal deposition using sequential, self-limiting reaction [104][105][106][107]. ALD, which has emerged as an important technique to fabricate catalysts with atomically precise design and control, has been utilized to deposit ultra-thin metal on graphitized nanocarbon and other types of supports [108][109][110][111].…”
Section: Atomic Layer Deposition Methodsmentioning
confidence: 99%