GaN nanowires were successfully prepared on Si(111) substrate through ammoniating Ga 2 O 3 /BN films deposited by radio frequency magnetron sputtering system. The synthesized nanowires were confirmed as hexagonal wurtzite GaN by X-ray diffraction, selected-area electron diffraction and Fourier transform infrared spectra. Scanning electron microscopy and transmission electron microscopy revealed that the grown GaN nanowires have a smooth and clean surface with diameters ranging from 40 to 160 nm and lengths typically up to several tens of micrometers. The representative photoluminescence spectrum at room temperature exhibited a strong UV light emission band centered at 363 nm and a relative weak purple light emission peak at 422 nm. The growth mechanism is discussed briefly.GaN has been considered to be the most promising optoelectronic material for such applications as light emitting diodes (LEDs), laser diodes (LDs) as well as high power electronic devices, due to its large direct energy band gap of 3.39 eV at room temperature and strongly emissive properties [1,2] . In the past decade, one-dimensional GaN nanomaterials have attracted extensive attention owing to their great uses in the novel nanoelectronic devices and the quantum devices [3] . Up to the present, several techniques have been developed to prepare one-dimensional GaN nanomaterials such as carbon nanotube-confined reaction [4] , template-based growth method [5] , catalytic growth [6] and direct reaction of metal Ga with NH 3 [7] . Furthermore, Huang et al. have reported successful fabrication of logic gates and demonstrated the computation capabilities from assembled p-Si and n-GaN crossed nanowire junctions [8] . However, the synthesis of high-quality GaN nanowires with a large-scale on Si substrate is very important for the application of GaN nanowires, and needs to be optimized.In this paper, we report a successful synthesis of highly crystalline GaN nanowires through ammoniating Ga 2 O 3 /BN films on Si(111) substrate deposited by radio frequency (RF) magnetron sputtering system. We chose hexagonal BN on Si (denoted BN/Si) as a substrate for hexagonal GaN films growth because of the reasonably low lattice mismatch (8%) [9] and higher thermal conductivity than that of sapphire; the latter is insulating and is poorly lattice matched (16%). Moreover, if GaN can be prepared on BN/Si, it will offer a very attractive way to incorporate future GaN optoelectronic devices into silicon-based very large-scale integrated circuits.
ExperimentThe GaN nanowires were prepared by a two-step method. The first step was to deposit Ga 2 O 3 /BN films on Si(111) substrate in turn using a JCK-500A RF magnetron sputtering system (13.56 MHz). The targets for depositing BN films and Ga 2 O 3 films were hot-pressed BN with a purity of 99.9% and sintered Ga 2 O 3 with a purity of 99.99%. The base pressure before sputtering was about 6.4×10 −4 Pa. The working gas was pure argon and the working pressure was 2 Pa. During deposition, the substrate' temperature was fixed at 30...