Postdeposition treatments (PDTs) of chalcopyrite absorbers with alkali fluorides have contributed to improving the efficiency of corresponding solar cell devices. However, cells prepared with PDTs also tend to exhibit nonideal current–voltage (J–V) characteristics especially at low temperatures. These include blocking of the forward diode current, saturation of the open‐circuit voltage with respect to temperature, a discrepancy between dark and Jsc (Voc) characteristics, and a crossover between dark and light J–V curves. These are typical observations while measuring the temperature‐dependent J–V characteristics. Herein, the influence of electronic material parameters on the blocking of the current across the heterojunction in numerical simulations is reported. It is shown that a low‐doped ZnO window layer, acceptor defects at the CdS/ZnO interface, or a high band offset at that interface lead to similar nonideal J–V characteristics, suggesting that the carrier density in the buffer layer is a crucial parameter for the current limitation. Connections between the effects of PDT previously reported in literature and the electronic material parameters considered in the numerical model are discussed to explain the nonideal J–V characteristics caused by the PDTs.