CdS Roughness by Anti-Stokes Raman Spectroscopy

Abstract

A Raman system, with the 514.5 and 632.8 nm excitations wavelengths, was used to qualitatively detect the surface roughness of a CdS wafer sample. Anti-Stokes Raman spectra were obtained from several sample zones with different mean roughness levels, previously measured with Atomic Force Microscopy. Our results show that there is a spectrum profile which can be related to the sample roughness, which shows a better definition with the 514.5 nm excitation wavelength.