Abstract:The possibility of removing organic compounds from wastewater originating from the photochemical production of printed circuit boards by use of waste acidifi cation and disposal of precipitated photopolymer in the fi rst stage and the UV-Fenton method in a second stage has been presented. To optimize the process of advanced oxidation, the RSM (Response Surface Methodology) for three independent factors was applied, i.e. pH, the concentration of Fe(II) and H 2 O 2 concentration. The use of optimized values of individual parameters in the process of wastewater treatment caused a decrease in the concentration of the organic compounds denoted as COD by approx. 87% in the fi rst stage and approx. 98% after application of both processes. Precipitation and the decomposition of organic compounds was associated with a decrease of wastewater COD to below 100 mg O 2 /L whereas the initial value was 5550 mg O 2 /L. Decomposition of organic compounds and verifi cation of the developed model of photopolymers removal was also carried out with use of alternative H 2 O 2 sources i.e. CaO 2 , MgO 2 , and Na 2 CO 3 ·1,5H 2 O 2 .