Ceria Based Protective Coatings for Steel Interconnects Prepared by Spray Pyrolysis

Abstract

Stainless steels can be used in solid oxide fuel/electrolysis stacks as interconnects. For successful long term operation they require protective coatings, that lower the corrosion rate and block chemical reactions between the interconnect and adjacent layers of the oxygen or the hydrogen electrode. One of the promising coating materials for the hydrogen side is ceria. Using standard sintering techniques, ceria sinters at around 1400°C which even for a very short exposure would destroy the interconnect. Therefore in this paper a low temperature deposition method, i.e. spray pyrolysis, is used to deposit thin (~400 nm), continuous CeO 2 layers on Crofer 22 APU steel substrates. Influence of the deposition parameters on layer quality is elucidated in this work.

Effective yttrium based coating for steel interconnects of solid oxide cells: Corrosion evaluation in steam-hydrogen atmosphere

“…Though several reports exists on electrolytic deposition of ceria or yttria coatings for protection of steel at high temperatures [23][24][25], none of the studies have addressed the corrosion behavior in reducing atmospheres. Especially at low temperatures (T < 750 °C as typical targeted for operating state of the art SOFC/SOEC cells), there is a scarcity of reports about corrosion properties in general [27][28][29]. Relevant available data gathered from literature on corrosion behavior in reducing environment are summarized in Table 1.…”

Microstructure and Electrical Properties of Fe,Cu Substituted (Co,Mn)3O4 Thin Films

“…Spray pyrolysis is a solution based deposition method, in which liquids are deposited on a heated substrate via droplets from a pressurized atomizer. In comparison to other solution based deposition methods, e.g., spin coating, thermal decomposition of the liquid precursor occur directly on the surface during the deposition process [19][20][21][22]. Therefore, spray pyrolysis is a cost and time effective method, well suited for fabrication of thin nanocrystalline films [19].…”