Thin film depositions of metallic silver were performed using metal±organic (MO) CVD on glass substrates using, as precursors, the two new compounds (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato)(2,2¢-bipyridine)silver(I), [Ag(hfac)(bipy)] (1), and (1,1,1,5,5,5-hexafluoro-2,4-pentanedionato)(N,N,N¢,N¢-tetramethylethylenediamine)silver(I), [Ag(hfac)(tmeda)] (2). Both silver compounds were characterized by single-crystal X-ray diffraction (XRD) measurements, indicating that 1 exists as a dimeric species, and 2 as polymeric chains. The films were analyzed by XRD, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM), revealing a high crystallinity and fairly good quality with little carbon and oxygen contamination when using the tetramethylethylenediamine derivative.