Chalcogenide Thin Films Prepared using Chemical Bath Deposition Method: Review

Soonmin, Ho

doi:10.19026/rjaset.11.2119

Cited by 8 publications

(4 citation statements)

References 57 publications

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“…When binary or ternary thin film materials are prepared by the CBD technique, the properties of most interest for further applications are the morphology, the crystalline structure, the optical or electrical properties and the stoichiometry [182][183][184][185][186][187][188][189][190][191]. For solar cells applications, for example, large grain size and certain thickness value are useful for improving the efficiency [192,193].…”

Section: Some Recent Advances On Chemically Deposited Materialsmentioning

confidence: 99%

The chemical process for materials deposition in aqueous solution: a review

Arias¹,

González-Chan

Várguez³

et al. 2022

Surface Engineering

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The material deposition in aqueous solution, also known as chemical bath deposition (CBD), is a well-established technique for the fabrication of semiconducting thin films. The success of the CBD technique is mainly based on the relatively easy implementation and operation requirements. The CBD has importantly contributed to the development of sensors, optical devices and solar cells applications. In this review, the origins and current state of the art of the CBD technique, the involved physicochemical processes, the growing mechanisms, and the analytical techniques for the estimation of optimal physicochemical conditions for the film deposition are discussed. Emphasis on authors' experience on CBD of CdS, ZnS, Zn (OH) 2 , and ZnO films are here highlighted, following methodologies for a high control of the deposited materials, such as the species distribution diagrams and the solubility curves.

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Section: Some Recent Advances On Chemically Deposited Materialsmentioning

confidence: 99%

The chemical process for materials deposition in aqueous solution: a review

Arias¹,

González-Chan

Várguez³

et al. 2022

Surface Engineering

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“…The obtained thin films were characterized by using various tools to investigate the properties of films. For example, structure, electrical, composition, morphology, topography and optical properties were investigated via X-ray diffraction [7], energy dispersive x-ray analysis, scanning electron microscopy, atomic force microscopy [8], UV-visible spectrophotometer [9], Raman spectroscopy, X-ray photoelectron spectroscopy [10], and Fourier transform infrared spectroscopy [11].…”

Section: Introductionmentioning

confidence: 99%

Untitled

2022

Int. J. Thin.Film. Sci. Tec.

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Preparation of thin films via chemical and physical deposition technique had been reported by many researchers. The obtained films were characterized by using various tools. Thin films were used in different applications including solar cell, light emitting diode, capacitor, photo detector, ultra violet opto-electronics, and photonic integrated circuit. In this work, the successive ionic layer adsorption and reaction (SILAR) method was used because of low temperature deposition, the simplest and the cheapest deposition method. This is the first time, composition of thin films (under various deposition cycles) was studied using energy dispersive x-ray analysis (EDX). EDX results confirmed that the atomic percentage of cobalt and selenide strongly depended on the number of deposition cycle in the experiment. Larger grain size could be observed for the thin films deposited for 20 cycles based on the field emission scanning electron microscopy analysis.

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“…There are many techniques used to prepare ternary CuAlS2 thin films, such as chemical spray pyrolysis (Caglar, Ilican, & Caglar, 2008), thermal evaporation (Abaab et al, 2000), sulfurization of metallic precursors in a vacuum (Bhandari, Hashimoto, & Ito, 2004), spark plasma sintering (Liu, Wang, Huang, Chen, & Wang, 2007), direct polyol methods (Yue, Wang, Wang, Wang, & Peng, 2008), wet chemical method (Harichandran & Lalla, 2008), simple colloidal route (Poulose et al, 2012), chemical vapour transport (CVT) technique (Chaki, Mahato, & Deshpande, 2014), hydrothermal method(HT) (Sugan, Baskar, & Dhanasekaran, 2015), metal organic chemical vapour deposition (MOCVD) (Damisa, Olofinjana, Ebomwonyi, Bakare, & Azi, 2017), and atomic layer deposition (Schneider et al, 2018), and chemical bath deposition technique (CBD). There are many advantages to use CBD technique comparing with other techniques such as low cost, available and inexpensive, environmentally friendly, deposition temperature is low and safe to use, simply controlling with deposition parameters, deposition with large area of thin films, chemical precursors are available and dissolved in distilled water, nontoxic for using, and simplicity for the preparation of films on various substrates (Ho, 2015). CBD technique of prepared CuAlS2 thin films were used by many researchers, where Tariq J. et al prepared CuAlS2 thin films by CBD technique on glass substrates, where all films were amorphous structure.…”

Section: Introductionmentioning

confidence: 99%

Effect of Molarconcentration of Precursorson the Structural, Opticaland Electrical Properties of Cuals2 Thin Films Prepared by Chemical Bath Deposition Technique

Taher¹,

Ahmad²

2021

MINAR Journal

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CuAlS2 thin films have been prepared on glass substrates by Chemical bath deposition (CBD) technique at a substrate temperature (Ts) 75C, pH value 10.5.The Effect of three different molar concentration (0.05, 0.025, 0.1), (0.075, 0.0375, 0.15), and (0.1, 0.05, 0.2) M of precursors of (CuSO4.5H2O, Al2(SO4)3.16H2O, and (NH2)2CS), respectively on the structural, optical and electrical properties of deposit thin films was studied. The X-ray diffraction (XRD) patterns showed that the films have an amorphous structure with simple enhancement in the structure of the films with the higher molar concentration. Field emission scanning electron microscopy (FESEM) analysis of thin films showed that the deposited films were a good surface morphology, homogenous and uniform spherical nanoparticles over the substrate surface with very little agglomerated particles with average grain size in the range (45 to 72 nm) increase with increasing molar concentration of precursors. Atomic force microscopy (AFM) showed the topography of deposited films has nanoparticles with structures like conical and lobes shape, with the average grain sizes, root mean square (rms) roughness, and surface roughness increase with increasing molar concentration of precursors. The optical analysis by UV-Vis Spectrophotometer showed high absorption in the ultraviolet region, with absorption edge and direct energy gaps (3.5 to 4eV) variedat different molar concentrations of precursors. The electrical results from Hall effect measurements showed that the values of resistivity, conductivity, mobility, and carrier concentration were varied in range (0.046 to 0.594ohm.cm), (1.86 to 21.7(ohm.cm)-1), (301to 1510 cm2/V.S), and (3.29×1016 to 1.46×1017 cm-3), respectively .Also,n-type conductivity was investigated for all prepared film sat different molar concentration of precursors. The obtained results of the prepared CuAlS2 thin films can be suitable in many optoelectronics applications.

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Chalcogenide Thin Films Prepared using Chemical Bath Deposition Method: Review

Cited by 8 publications

References 57 publications

The chemical process for materials deposition in aqueous solution: a review

The chemical process for materials deposition in aqueous solution: a review

Untitled

Effect of Molarconcentration of Precursorson the Structural, Opticaland Electrical Properties of Cuals2 Thin Films Prepared by Chemical Bath Deposition Technique

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