Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Kang, Hyunah; Lee, Sung‐Woo; Lee, Doo-Youl; Yeo, Gi-Sung; Lee, Junghyeon; Cho, Han-Ku; Han, Woo-Sung; Moon, Joo-Tae

doi:10.1117/12.485472

SPIE Proceedings

2003

DOI: 10.1117/12.485472

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Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Hyunah Kang

Sung‐Woo Lee

Doo-Youl Lee

et al.

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Challenge for effective OCV control in 90-nm logic gate using ArF lithography

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