Change Spectrum Characteristics Modification of Films Deposited by Magnetron Sputtering with the Assistance of Argon Ions Beam

The change in optical and electrical characteristics of tin oxide films under the action of argon ion beam

“…It should be said, when the irradiation time is 13 -22 seconds, there is the increase in transmittance at wavelengths less than 360 nm and a slight increase in the infrared region. The increase in transmission, especially in the short-wavelengths region, of the irradiated films is related to the change of the plasma frequency [10][11][12]. This change is a consequence of the electrons concentration increasing.…”

“…However, the further irradiation time increase leads to the film resistance increase. This is, possibly, connected with the formation of Sn self-point defects [11][12]. Whereas, the point defects interact with all conductive electrons, so the electrons, located near the defects, are "bound" and do not participate in conductivity.…”