2021
DOI: 10.1016/j.apsusc.2021.149437
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Changes in the chemical state of metallic Cr during deposition on a polyimide substrate: Full soft XPS and ToF-SIMS depth profiles

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Cited by 22 publications
(10 citation statements)
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“…The Figure 2(a) shows that the main elements of the synthesized LDHs are Zn, Cr, O and C. The XPS spectrum of Zn in Figure 2(d) shows two main peaks at about 1021.53 eV and 1044.59 eV, which are assigned to Zn 2p (1/2) and Zn 2p (3/2), [27] respectively, which prove to be Zn−O and a divalent double metal oxide [28] . The Figure 2(c) double characteristic peaks of Cr at 577.79 eV and 586.17 eV, corresponding to Cr−O and Cr 2p (3/2) and Cr 2p (1/2) of trivalent bimetallic oxide, respectively [29] . The XPS spectrum of O1s is shown in Figure 2(b), and peaks at 531.10 eV, 532.73 eV, and 529.48 eV correspond to a Cr−O bond, a C=O bond, and a Zn−O bond in the carboxylic acid group.…”
Section: Resultsmentioning
confidence: 94%
“…The Figure 2(a) shows that the main elements of the synthesized LDHs are Zn, Cr, O and C. The XPS spectrum of Zn in Figure 2(d) shows two main peaks at about 1021.53 eV and 1044.59 eV, which are assigned to Zn 2p (1/2) and Zn 2p (3/2), [27] respectively, which prove to be Zn−O and a divalent double metal oxide [28] . The Figure 2(c) double characteristic peaks of Cr at 577.79 eV and 586.17 eV, corresponding to Cr−O and Cr 2p (3/2) and Cr 2p (1/2) of trivalent bimetallic oxide, respectively [29] . The XPS spectrum of O1s is shown in Figure 2(b), and peaks at 531.10 eV, 532.73 eV, and 529.48 eV correspond to a Cr−O bond, a C=O bond, and a Zn−O bond in the carboxylic acid group.…”
Section: Resultsmentioning
confidence: 94%
“…For example, the depth resolution in our measurement system (∼10 nm) exceeds the PtTe 2 film thickness, resulting in the inclusion of chemical information in the depth profile of the AlO x substrate. Monatomic ions used for sputtering compound semiconductors can result in preferential sputtering of volatile components of the compound and changes in the chemical state and surface structure ( Kubo et al., 2021 ; Yufit et al., 2008 ). Furthermore, the transport studies of PtTe 2 were conducted only for the 4-nm-thick polycrystalline films.…”
Section: Resultsmentioning
confidence: 99%
“…For HAXPES, θ was varied to observe changes in the chemical state at various depths from the sample surface. More information regarding the shallower regions was derived by using a lower θ. , According to the TPP–2M formula, , the inelastic mean free path λ was 12.6 nm for the photoelectrons with a kinetic energy of 7662 eV, corresponding to C 1s, and the bulk Al matrix (density: 2.7 g/cm 3 ). The θ values of 30 and 80° enabled analysis at maximum depths of 18.9 and 37.2 nm, respectively, which were calculated from 3λ × sin θ (95% of the signal was derived from 3λ) …”
Section: Resultsmentioning
confidence: 99%
“…In this study, we developed a novel analytical approach to link the morphology, diffusion, and chemical interactions to the adhesion at the interface between the FP coating and metal substrate. First, a cryogenic setup was employed to reduce the electron beam damage during TEM observation. , In addition, the samples were fabricated by an improved process to model the FP–metal interface for analysis by synchrotron hard XPS (HAXPES). ,, The fabrication process is based on that previously proposed for a Cu/PI bilayer structure, which can control the Cu film thickness to a precision of 1 nm, and has been used to laminate flexible printed circuits with Cu . We used these techniques to clarify the changes in the elemental diffusion and chemical bonding state at the interface between a fluorinated ethylene–polypropylene (FEP) coating and Al substrate due to the 1000 keV electron irradiation.…”
Section: Introductionmentioning
confidence: 99%