2020
DOI: 10.1134/s1063780x2001002x
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Changes in the Properties and Surface Structure of Grain Seeds under the Influence of a Glow Dischargeat Atmospheric Pressure

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Cited by 15 publications
(5 citation statements)
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“…As explained above, these rather marginal effects are probably due to the low power absorbed by ICP in the E-mode. As etching intensifies with increased treatment power [43], our H-mode plasma treatment causes extensive etching even though the beans are kept at a floating potential, and thus, the ion bombardment is negligible as compared to other effects. On the other hand, exposure to an oxygen DBD caused alterations to the seed coat and cotyledon surfaces, as observed by SEM at rather low magnifications [14].…”
Section: Scanning Electron Microscopymentioning
confidence: 99%
“…As explained above, these rather marginal effects are probably due to the low power absorbed by ICP in the E-mode. As etching intensifies with increased treatment power [43], our H-mode plasma treatment causes extensive etching even though the beans are kept at a floating potential, and thus, the ion bombardment is negligible as compared to other effects. On the other hand, exposure to an oxygen DBD caused alterations to the seed coat and cotyledon surfaces, as observed by SEM at rather low magnifications [14].…”
Section: Scanning Electron Microscopymentioning
confidence: 99%
“…Further, extensive functionalization can remove material from the sample surface by the process of chemical etching [35]. The etching of the surface typically increases with increased treatment time and generator power, as was seen in wheat seeds treated with a glow discharge in argon [11]. The extent of etching seen in Figure 4 is moderate but evident.…”
Section: Scanning Electron Microscopymentioning
confidence: 96%
“…Etching of the wheat seed surface was seen after low-pressure capacitively coupled (CC) radio frequency (RF) air plasma treatment [7], medium-pressure glow discharge treatment [8,9], as well as dielectric barrier discharge (DBD) treatment using various gases at atmospheric pressure [10]. By using a glow discharge in argon, the etching of the surface was found to increase with increased treatment time and input power [11]. Further, in an inductively coupled (IC) RF plasma system, etching depended on the direct or indirect nature of treatment; nanostructuring was only seen following glow, but not afterglow, plasma treatment [12].…”
Section: Introductionmentioning
confidence: 99%
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“…In recent domestic and foreign literature, it is proposed to use the method of plasma modification (treatment) of both the seed surface and the use of plasma-activated water before sowing to solve this problem. The authors obtained positive results on some cereals, legumes, oilseeds, melons, tubers, as well as on three forest woody plants from the genera: Pinus L., Betula L. and Acer L. [2][3][4][5][6][7][8].…”
Section: Introductionmentioning
confidence: 99%