Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope

Abstract

Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 1 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV-10 KeV x-rays. It is now possible to produce high quality flat silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.