2009
DOI: 10.14429/dsj.59.1532
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Characterisation of Semiconductor Materials/Device Structures using SIMS

Abstract: Secondary ion mass spectrometry (SIMS) is an analytical technique that can be used to characterise the surface and near-surface region of solids. The instrument operation and data analysis have been discussed to obtain meaningful results. The paper discusses the technique of sequential sputtering to elucidate the thickness of individual layers in a multilayer structure. The application of the technique for failure analysis, standard generation and interface studies have been discussed in detail taking examples… Show more

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Cited by 1 publication
(1 citation statement)
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“…The constructed Indium-GaAs interfaces (samples M1-M3) were analyzed by determining the distribution of indium and GaAs in the layers by concentration-depth spectra with secondary ion mass spectroscopy (SIMS). This made it possible to accurately infer the shape of indium/GaAs structures [33]. Component concentrations, as functions of the thickness in the M1 sample, are shown in Fig.…”
Section: Secondary Ion Mass Spectroscopymentioning
confidence: 99%
“…The constructed Indium-GaAs interfaces (samples M1-M3) were analyzed by determining the distribution of indium and GaAs in the layers by concentration-depth spectra with secondary ion mass spectroscopy (SIMS). This made it possible to accurately infer the shape of indium/GaAs structures [33]. Component concentrations, as functions of the thickness in the M1 sample, are shown in Fig.…”
Section: Secondary Ion Mass Spectroscopymentioning
confidence: 99%