Characterisation of thin SiOx-layers on float glass deposited by Combustion Chemical Vapour Deposition (C-CVD)

Cobalt and manganese carboxylates for metal oxide thin film deposition by applying the atmospheric pressure combustion chemical vapour deposition process

“…In contrast, the non-vacuum-based combustion chemical vapour deposition (CCVD) process is a very cost effective deposition technique and hence makes it a lucrative method for metal and/or metal oxide deposition. 16 By changing the CCVD parameters, the film morphology can be easily controlled in surface roughness, surface area and porosity. Accordingly, ultrathin SiO x layers on glass substrates were deposited under varied conditions (substrate temperature, burner passes and substrate velocity) creating a barrier against glass leaching.…”

“…Accordingly, ultrathin SiO x layers on glass substrates were deposited under varied conditions (substrate temperature, burner passes and substrate velocity) creating a barrier against glass leaching. 16 Similarly prepared silicon dioxide layers provide an alternative to conventional surface treatment for reactive metals, Schinkinger et al investigated CCVD nanoscaled SiO 2 films on zinc-coated steel as an interface between an organic coating and the metal substrate. 17 Moreover, thin ZnO layers have been deposited by CCVD using non-volatile zinc nitrate as metal oxide source.…”