2017
DOI: 10.1107/s1600576717014455
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Characteristic diffuse scattering from distinct line roughnesses

Abstract: Lamellar gratings are widely used diffractive optical elements; gratings etched into Si can be used as structural elements or prototypes of structural elements in integrated electronic circuits. For the control of the lithographic manufacturing process, a rapid in‐line characterization of nanostructures is indispensable. Numerous studies on the determination of regular geometry parameters of lamellar gratings from optical and extreme ultraviolet (EUV) scattering highlight the impact of roughness on the optical… Show more

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Cited by 4 publications
(2 citation statements)
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“…In the presence of roughness, light is scattered out of the position of the diffraction orders and several scattering phenomena can be observed 10,12,32,33 . The total intensity of the out-scattered light depends on the amplitude of the roughness.…”
Section: Impact Of Imperfections On the Scattering Patternmentioning
confidence: 99%
See 1 more Smart Citation
“…In the presence of roughness, light is scattered out of the position of the diffraction orders and several scattering phenomena can be observed 10,12,32,33 . The total intensity of the out-scattered light depends on the amplitude of the roughness.…”
Section: Impact Of Imperfections On the Scattering Patternmentioning
confidence: 99%
“…However, the Debye Waller factor accounts only for the effective roughness of the edge and not for the correlation of the edges. To distinguish the roughness types, we previously reported the observation of the resonant diffuse scattered sheets 32 . Figure 4 shows the light scattered from the sample with a low amplitude of the line edge roughness (LER1).…”
Section: Impact Of Imperfections On the Scattering Patternmentioning
confidence: 99%