2000
DOI: 10.1016/s0277-5387(00)00401-0
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Characteristic mechanisms of the homogeneous and heterogeneous oxidation of aromatic amines with transition metaloxalate complexes

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Cited by 45 publications
(30 citation statements)
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“…In the case of ophen, the difference was more pronounced, in line with earlier observations regarding the oxidation rates of these ions. 29 The results, nevertheless, indicate that most of the oxidation occurs during the ESI process.…”
Section: Complex Formationmentioning
confidence: 91%
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“…In the case of ophen, the difference was more pronounced, in line with earlier observations regarding the oxidation rates of these ions. 29 The results, nevertheless, indicate that most of the oxidation occurs during the ESI process.…”
Section: Complex Formationmentioning
confidence: 91%
“…Oxidation of the para isomer occurs faster than oxidation of the ortho isomer. 29 The oxidation rates of amines are also greatly affected by the temperature. Radical cations, too, are relatively easily formed in the oxidation.…”
Section: Complex Formationmentioning
confidence: 99%
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“…The amount of research work on semiconductor photoenergy processes has grown exponentially. A 5th International Conference on Advanced Engineering Materials and Technology (AEMT 2015) number of devices using TiO 2 for solar energy conversion, such as solar cells or hotocatalytic systems have been developed for the past four decades [14][15][16]. This semiconductor has been widely considered as photocatalyst due to its high photocatalytic activity, photostability, and non-toxicity.…”
Section: Introductionmentioning
confidence: 99%
“…The amount of research work on semiconductor photoenergy processes has grown exponentially. A number of devices using TiO 2 for solar energy conversion, such as solar cells or hotocatalytic systems have been developed for the recent years [14][15][16]. This semiconductor has been widely considered as photocatalyst due to its high photocatalytic activity, photostability, and non-toxicity.…”
Section: Introductionmentioning
confidence: 99%