Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization

Ohtsu, Yasunori; Nakashima, Takahiro; Tanaka, R.; Schulze, Julian

doi:10.1016/j.vacuum.2020.109593

Cited by 6 publications

(2 citation statements)

References 15 publications

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“…Such so-called planar magnetron discharges have the advantage of a higher sputter rate compared to discharges without a magnetic field, but suffer from a decreased degree of target material utilization, since the sputter process predominantly takes place in the magnetized torus, which forms the typical racetrack on the target surface. In order to overcome this disadvantage a cylindrical target or rotating magnets for planar targets can be used [6][7][8].…”

Section: Introductionmentioning

confidence: 99%

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Berger

Eremin

Oberberg

et al. 2023

Plasma Sources Sci. Technol.

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In magnetized capacitively coupled radio-frequency discharges operated at low pressure the inﬂuence of the magnetic ﬂux density on discharge properties has been studied recently both by experimental investigations and in simulations. It was found that the Magnetic Asymmetry Eﬀect allows for a control of the DC self-bias and the ion energy distribution by tuning the magnetic ﬁeld strength. In this study, we focus on experimental investigations of the electron power absorption dynamics in the presence of a magnetron-like magnetic ﬁeld conﬁguration in a low pressure capacitive RF discharge operated in argon. Phase Resolved Optical Emission Spectroscopy measurements provide insights into the electron dynamics on a nanosecond-timescale. The magnetic ﬂux density and the neutral gas pressure are found to strongly alter these dynamics. For speciﬁc conditions energetic electrons are eﬃciently trapped by the magnetic ﬁeld in a region close to the powered electrode, serving as the target surface. Depending on the magnetic ﬁeld strength an electric ﬁeld reversal is observed that leads to a further acceleration of electrons during the sheath collapse. These ﬁndings are supported by 2-dimensional Particle in Cell simulations that yield deeper insights into the discharge dynamics.

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Section: Introductionmentioning

confidence: 99%

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Berger

Eremin

Oberberg

et al. 2023

Plasma Sources Sci. Technol.

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“…Nowadays, different magnetron sputtering processes have been widely used in the fabrication of magnetic tunnel junctions. By adjusting the magnetic field distribution of the cathode target and optimizing the target source, the problem of low utilization of magnetron sputtering targets has also been improved [41]. As an important method for depositing metal and non-metal thin films.…”

Section: Magnetron Sputteringmentioning

confidence: 99%

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Tsai

2022

Nanomaterials

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The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer deposition (ALD) and atomic layer etching (ALE). To begin, we introduce the main atomic layer deposition techniques. Then, in a brief review, we discuss ALE technology for insulators, semiconductors, metals, and newly created two-dimensional van der Waals materials. Additionally, we compare the critical factors learned from ALD to constructing ALE technology. Finally, we discuss the future prospects and challenges of atomic layer technology in the field of spinronics.

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Impact of Inhomogeneous Magnetic Fields on Polymer Deposition in Low‐Pressure Capacitively Coupled Ar/C₄F₈ Plasma

Kim,

Han,

Park

et al. 2024

Plasma Processes & Polymers

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Magnetized plasmas are widely utilized in semiconductor fabrication due to their high processing efficiency. However, comprehensive studies involved in thin film formation—particularly the influence of magnetic fields on elemental reactions—remain limited. Additionally, using CxFy gases for plasma processing presents challenges in understanding the behavior of magnetized plasma. Thus, the effects of inhomogeneous magnetic fields on polymer deposition in low‐pressure, magnetized Ar/C4F8 plasma were investigated through spatially resolved diagnostics. Introducing inhomogeneous magnetic fields led to notable localized changes, increasing ion, CF2, and F densities by factors of 2.29, 1.44, and 1.71 times, respectively. These variations resulted in thinner films with lower carbon‐to‐fluorine ratios. The findings highlight the potential of asymmetric plasma parameter control to modulate film properties locally.

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Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization

Cited by 6 publications

References 15 publications

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Impact of Inhomogeneous Magnetic Fields on Polymer Deposition in Low‐Pressure Capacitively Coupled Ar/C₄F₈ Plasma

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Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization

Cited by 6 publications

References 15 publications

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Electron dynamics in planar radio frequency magnetron plasmas: III. Comparison of experimental investigations of power absorption dynamics to simulation results

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Impact of Inhomogeneous Magnetic Fields on Polymer Deposition in Low‐Pressure Capacitively Coupled Ar/C4F8 Plasma

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Product

Resources

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Impact of Inhomogeneous Magnetic Fields on Polymer Deposition in Low‐Pressure Capacitively Coupled Ar/C₄F₈ Plasma