Characteristics of Er/sup 3+/:Al/sub 2/O/sub 3/ thin-films deposited by reactive co-sputtering for application in optical amplification

Musa, S.; Weerden, H.J. van; Yau, T.H.; Lambeck, Paul

doi:10.1109/leos.1999.811985

1999 IEEE LEOS Annual Meeting Conference Proceedings. LEOS'99. 12th Annual Meeting. IEEE Lasers and Electro-Optics Society 1999

DOI: 10.1109/leos.1999.811985

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Characteristics of Er/sup 3+/:Al/sub 2/O/sub 3/ thin-films deposited by reactive co-sputtering for application in optical amplification

S. Musa

H.J. van Weerden²,

T.H. Yau³

et al.

Abstract: -Er3+-doped A 2 0 3 films have been deposited by reactive co-sputtering onto thermally oxidized Siwafers for use in optical amplification. Low background losses and broad emission band were measured. High concentration and gain can be achieved.

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Characteristics of Er/sup 3+/:Al/sub 2/O/sub 3/ thin-films deposited by reactive co-sputtering for application in optical amplification

Abstract: -Er3+-doped A 2 0 3 films have been deposited by reactive co-sputtering onto thermally oxidized Siwafers for use in optical amplification. Low background losses and broad emission band were measured. High concentration and gain can be achieved.

Cited by 0 publications

References 5 publications

No citations

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