“…Recently, many wide-band gap metal oxide semiconductor (MOS) materials, including zinc oxide (ZnO), nickel oxide (NiO), copper oxide (CuO), tin oxide (SnO 2 ), titanium dioxide (TiO 2 ), lead dioxide (PbO 2 ), ruthenium oxide (RuO 2 ), iridium dioxide (IrO 2 ), tungsten trioxide (WO 3 ), tantalum pentoxide (Ta 2 O 5 ), antimony trioxide (Sb 2 O 3 ), and indium oxide (In 2 O 3 ), have attracted considerable interest because of their special material performance in pH nanodevices. − Among them, the ZnO structure belongs to the II–VI groups of n-type MOS materials and has a large band gap of approximately 3.37 eV at room temperature and a high-exciton binding energy of about 60 meV. − ZnO MOS with crystal lattice constants of a = 0.3249 nm and c = 0.5207 nm is a hexagonal wurtzite system. It has many outstanding properties, such as low price, nontoxicity, remarkable thermochemical stability, excellent carrier mobility, good biocompatibility, and high mechanical strength. , One-dimensional (1-D) ZnO nanomaterials have been used in various electric components, such as pH sensors, gas sensors, ultraviolet photodetectors (UV PDs), nanogenerators (NGs), field-emission (FE) emitters, photocatalysts, light-emitting diodes (LEDs), glucose sensors, thin-film transistors (TFTs), and solar cells. − Up to now, many researchers have studied the preparation methods of ZnO nanorods (NRs), including thermal evaporation, hydrothermal methods, vapor–solid (VS), pulsed laser deposition (PLD), electrochemical deposition, and chemical vapor deposition (CVD). Among them, the hydrothermal method is also called the chemical bath deposition (CBD) method and has gradually become a mainstream method for preparing ZnO nanostructures.…”