2021
DOI: 10.1155/2021/6649200
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Characteristics of Metal–Semiconductor–Metal Ultraviolet Photodetectors Based on Pure ZnO/Amorphous IGZO Thin-Film Structures

Abstract: In this study, metal–semiconductor–metal-structured ultraviolet (UV) photodetectors (PDs) based on pure zinc oxide (ZnO) and amorphous indium gallium zinc oxide (a-IGZO) thin films were fabricated and characterized. The ZnO seed layers were deposited on Corning glass substrates via a radio frequency (RF) magnetron sputtering technique. Results showed that under a 5 V applied bias; the dark currents of the pure ZnO and a-IGZO thin films were 0.112 pA and 2.85 nA, respectively. Meanwhile, the UV-to-visible rejec… Show more

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Cited by 9 publications
(6 citation statements)
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“…As a result, the optic property of normal ZnO peak can be divided into two regions, such as the UV emission and green emission. [15][16][17] The UV emission is located in wavelength of 380 nm, which considers as from near band-edge emission or free-exciton. On the other hand, the green emission is centered in ∼580 nm, which indicated ZnO intrinsic defects or oxygen vacancies.…”
Section: Methodsmentioning
confidence: 99%
“…As a result, the optic property of normal ZnO peak can be divided into two regions, such as the UV emission and green emission. [15][16][17] The UV emission is located in wavelength of 380 nm, which considers as from near band-edge emission or free-exciton. On the other hand, the green emission is centered in ∼580 nm, which indicated ZnO intrinsic defects or oxygen vacancies.…”
Section: Methodsmentioning
confidence: 99%
“…In fact, pure ZnO-based UV-PDs were reported as early as the 1980s [122]. Lam et al [123], Hsiao et al [124] and Yang et al [125] have successfully fabricated pure ZnO UV-PDs, but with relatively poor photo/dark current ratios, which do not exceed 1000. The drawback of ZnO lies in its difficulty to achieve p-type doping as previously mentioned.…”
Section: Nitride-zno Heterojunction Uv-pdmentioning
confidence: 99%
“…Recently, many wide-band gap metal oxide semiconductor (MOS) materials, including zinc oxide (ZnO), nickel oxide (NiO), copper oxide (CuO), tin oxide (SnO 2 ), titanium dioxide (TiO 2 ), lead dioxide (PbO 2 ), ruthenium oxide (RuO 2 ), iridium dioxide (IrO 2 ), tungsten trioxide (WO 3 ), tantalum pentoxide (Ta 2 O 5 ), antimony trioxide (Sb 2 O 3 ), and indium oxide (In 2 O 3 ), have attracted considerable interest because of their special material performance in pH nanodevices. Among them, the ZnO structure belongs to the II–VI groups of n-type MOS materials and has a large band gap of approximately 3.37 eV at room temperature and a high-exciton binding energy of about 60 meV. ZnO MOS with crystal lattice constants of a = 0.3249 nm and c = 0.5207 nm is a hexagonal wurtzite system. It has many outstanding properties, such as low price, nontoxicity, remarkable thermochemical stability, excellent carrier mobility, good biocompatibility, and high mechanical strength. , One-dimensional (1-D) ZnO nanomaterials have been used in various electric components, such as pH sensors, gas sensors, ultraviolet photodetectors (UV PDs), nanogenerators (NGs), field-emission (FE) emitters, photocatalysts, light-emitting diodes (LEDs), glucose sensors, thin-film transistors (TFTs), and solar cells. Up to now, many researchers have studied the preparation methods of ZnO nanorods (NRs), including thermal evaporation, hydrothermal methods, vapor–solid (VS), pulsed laser deposition (PLD), electrochemical deposition, and chemical vapor deposition (CVD). Among them, the hydrothermal method is also called the chemical bath deposition (CBD) method and has gradually become a mainstream method for preparing ZnO nanostructures.…”
Section: Introductionmentioning
confidence: 99%