Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method

Jun, Shin-Hee; Kim, Junho; Kim, Sunkwang; You, Y.Z.; Cha, Boram

doi:10.5695/jkise.2013.46.5.187

Cited by 6 publications

(5 citation statements)

References 12 publications

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“…The adequate N reacted with Nb atoms and the superfluous N atoms could squash into the interstitial positions of NbN structure, which finally reached to a saturated value. It was considered that the relatively high N 2 /Ar gas ratio (over 0.3) leads to the formation of coatings with over N content, which was also found by Benkahoul et al and Jun et al [11,24]. The NbN x>1 coatings sputtered under these conditions are all over stoichiometric x = N/Nb > 1.…”

Section: Methodsmentioning

confidence: 68%

Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

et al. 2017

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The NbN x>1 coatings were deposited on Si wafer and SUS 304 stainless steel substrates by a high power impulse magnetron sputtering (HiPIMS) system at various bias voltages and the ratios of nitrogen and argon (N 2 /Ar). By virtue of electron probe microanalysis (EPMA), X-ray diffraction pattern (XRD), scanning electron microscope (SEM), atomic force microscope (AFM) and nano indentation test, the relationships between deposition parameters and coatings properties were examined in detail. These coatings show a strong preferred orientation of (200) plane at free bias voltage. With increasing bias voltage, the intensity of (200) plane peak became weaker and the full width at half maximum of peaks ((200) and (111) peaks) became broader, implying the crystalline grain size were decreased. The (200) plane almost is disappeared at −150 V bias voltage and the phase transition maintains the same change tendency with the increase of N 2 /Ar gas ratio. The coating microstructure gradually evolved from coarse columnar to dense columnar, and then to compact featureless structure with increase of the bias voltage, corresponding to the decreased surface roughness. The columnar structure of coatings is unrelated to N 2 /Ar gas ratio and the thickness is minimum at high N 2 /Ar ratio, which is attributed to the poor sputtering capability of nitrogen compared with argon instead of target poisonous effect. The higher hardness (H) and elastic recovery value are obtained for NbN x>1 (H = 31.3 GPa and W e = 69.2%) at −150 V bias voltage, suggesting considerable influence of bias voltage on hardness than that of the N 2 /Ar gas ratio.

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Section: Methodsmentioning

confidence: 68%

Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

et al. 2017

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“…Figure 1(a) and (b) present NbN film/Si deposited at 150 W, where, it was found, that the film has a dense structure, and the thickness is about 600 nm) at 150 W using secondary electron (SE) detector and backscattering electron detector (BSE). with increasing the DC power, The thickness increased, this behavior was accord with the result of Jun et al (2013). Also, Figure 1(c) presents image of SEM top view for NbN film/Si at 10 k magnification, where surface morphology shows nanostructure with average grain about 75 nm.…”

Section: Resultsmentioning

confidence: 99%

Study of morphological, physical and mechanical properties of thin NbN films synthesized via DC magnetron sputtering system

Abdallah,

Kakhia,

Masloub

et al. 2023

WJE

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Purpose Niobium Nitride (NbN) was interesting material for its applications in the medicinal tools or tools field (corresponding to saline serum media) as well as in mechanical properties. The aim of this work was depositing NbN thin films on two types of substrates (stainless steel (SS304) and silicon (100)) using plasma technique at varied powers (100–150 W). Design/methodology/approach DC magnetron sputtering technique at different powers were used to synthesis NbN films. Film structure was studied using X-ray diffraction (XRD) pattern. Rutherford elastic backscattering and energy dispersive X-ray were used to examine the deposited film composition. The films morphology was studied via atomic force microscopy and scanning electron microscopy images. Corrosion resistance of the three NbN/SS304 films was studied in 0.9% NaCl environment (physiological standard saline). Findings All properties could be controlled by the modification of DC power, where the crystallinity of samples was changed and consequently the corrosion and microhardness were modified, which correlated with the power. NbN film deposited at higher power (150 W) has shown better corrosion resistance (0.9% NaCl), which had smaller grain size (smoother) and was thicker. Originality/value The NbN films have a preferred orientation (111) matching to cubic structure phase. Corrosion resistance was enhanced for the NbN films compared to SS304 substrates (noncoating). Therefore, NbN films deposited on SS304 substrate could be applied as medicinal tools as well as in mechanical fields.

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“…1b) and a dielectric tube covered 1 turn internal antenna type inductively coupled plasma assistance (Fig 1c). ICP assisted magnetron sputtering has been widely used in depositing high performance thin films [6,7,8,9,10,11].…”

Section: Methodsmentioning

confidence: 99%

Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array

Joo¹

2014

Applied Science and Convergence Technology

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A real-time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a 125 mm×625 mm size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge's behavior.

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Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method

Cited by 6 publications

References 12 publications

Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

Study of morphological, physical and mechanical properties of thin NbN films synthesized via DC magnetron sputtering system

Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array

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