Characteristics of Silicon/Nitrogen-Incorporated Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition

Abstract

We have deposited silicon/nitrogen-incorporated diamond-like carbon (Si–N-DLC) films by radio-frequency plasma-enhanced chemical vapor deposition (PECVD) using methane (CH4), argon (Ar), and hexamethyldisilazane [(CH3)3Si]2NH as the Si and N source, and investigated the structure and the mechanical and tribological properties of the films. We compared the properties of the Si–N-DLC films with those of the Si-incorporated DLC (Si-DLC) films prepared by PECVD using monomethylsilane (CH3SiH3) as the Si source. It was found that the N incorporation together with Si into DLC was effective in further decreasing the internal stress and increasing the adhesion strength. The friction coefficients of the Si–N-DLC films containing 4.0% N or less were as low as those of the Si-DLC films. We also found that the Si–N-DLC film containing 10.0% Si and 4.0% N had a higher wear resistance than the Si-DLC film containing 10.8% Si. The wear rate was comparable to that of the undoped DLC film.

Hydrogen Effects on the Properties of Silicon/Nitrogen-Coincorporated Diamond-Like Carbon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition

“…In our recent study, we have deposited Si-N-DLC films by radiofrequency (rf ) plasma-enhanced chemical vapor deposition (PECVD) using hexamethyldisilazane ([(CH 3 ) 3 Si] 2 NH; HMDS) as the Si and N source, and systematically investigated the structure and the mechanical and tribological properties of the films. 14) We found that the adhesion of Si-N-DLC films was improved compared with that of Si-DLC films because of the further reduction of internal stress. The friction coefficient values of the Si-N-DLC films were as low as those of the Si-DLC films in air.…”

“…Specific wear rate of DLC films plotted as a function of HMDS flow ratio. Data of the films deposited with Ar are from Nakazawa et al 14) had been exposed in the wear track regions after the friction tests. Meanwhile, the wear rates of the DLC films deposited with H 2 tended to be lower than those of the films with Ar.…”

“…Dependence of internal compressive stress of DLC films on HMDS flow ratio. Data of the films deposited with Ar are from Nakazawa et al14)…”

“…(a) Friction coefficient curves of DLC films deposited with H 2 in ambient air and (b) friction coefficient of DLC films plotted as a function of HMDS flow ratio. Data of the films deposited with Ar are from Nakazawa et al14)…”

A DoE–TOPSIS meta-model for parametric optimization of silicon carbonitride (SiCN) thin film deposition process

“…Hydrogen being a diatomic light gas can easily diffuse through any material while carrying out the synthesis process. Thus, increase in H 2 flow rate had resulted in (a) improving the hardness (b) reducing the wear rate and friction coefficient of the SiCN thin film [6,7]. Sundaram et al [8] found an increasing trend of hardness and young's modulus values of the SiCN thin films with an increase in the nitrogen flow rate.…”