Characteristics of sputter-deposited BaTiO3/SrTiO3 artificial superlattice films on an LaNiO3-coated SrTiO3 substrate

Dielectric enhancement of BaTiO3/SrTiO3 superlattices with embedded Ni nanocrystals

“…Compared with published literature about BTO/STO superlattices shown in Fig. 3(b)-(d) [1][2][3], the value of ε for BTO/STO superlattices with embedded Ni NCs was enhanced. According to Drude quasi-free-electron theory, the relative permittivity of metal are given by…”

“…Ferroelectric materials have attracted an increasing attention, especially BaTiO 3 (BTO)/SrTiO 3 (STO) superlattices, as an important class of functional materials with a variety of present and potential applications as well as a fundamental interest in high dielectric constant, nonzero remnant polarization, and nonlinear dielectric properties [1][2][3][4][5]. Therefore, extensive research has been carried out to obtain large dielectric constant and nonlinear dielectric properties since the dielectric properties are of fundamental importance in ferroelectric thin film devices.…”

“…(a) The variation of real permittivity (ε ) with frequency at room temperature; the ε in the insets (b)-(d) correspond to Refs [1][2][3][2,3]…”

“…; the inset (e) recorded the variation of dielectric loss (tan ı) with frequency at room temperature, the tan ı in the insets (f) and (g) correspond to Refs [2,3]…”

Growth of BiFeO3/SrTiO3 artificial superlattice structure by RF sputtering

“…Sputtering is an important method for deposition of an epitaxial perovskite oxide film because the chemical composition is highly reproducible and the process is easily controlled. As Bi readily escapes from the thin film at high temperature deposition, knowledge about the growth of an epitaxial BiFeO 3 superlattice film of high crystalline quality prepared with RF sputtering is highly desirable but is not yet well established, although we have fabricated several ferroelectric superlattices of perovskite-oxide structure by RF sputtering [19,[26][27][28]. To obtain an epitaxial superlattice film, one must select a suitable temperature for deposition, an optimal pressure of the background gas and an appropriate rate of deposition; all these parameters have a strong influence on the microstructure of the films.…”