2000
DOI: 10.1063/1.1289785
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Characteristics of the low energy photoluminescence in μc-Si films

Abstract: The temperature and excitation-intensity dependence of the ∼0.9 eV photoluminescence (PL) band has been studied in several microcrystalline silicon (μc-Si) films with varied crystallinity. When the measurement temperature is increased from 15 to 180 K, the PL peak energy redshifts from 1.0 to 0.83 eV. The PL quenching of the intensity follows a model of carrier thermalization in an exponential band tail with a width of ∼20 meV. The total PL intensity (IPL) as a function of excitation intensity (Iex) obeys a po… Show more

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Cited by 11 publications
(2 citation statements)
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“…In the initial state, the 100 Å thick buffer layer blocks the shunt current and increases V oc and FF for the mixed-phase solar cells (cell 11 and cell 13) [8], but does not show an effect on the cell with a fully amorphous signature (cell 23). region appears [9][10][11]. After light soaking, the light-induced V oc increase was observed in both the cells with no buffer layer and with a 100 Å thick buffer layer, but was not observed in the cells with a 500 Å thick buffer.…”
Section: Experimental and Resultsmentioning
confidence: 93%
“…In the initial state, the 100 Å thick buffer layer blocks the shunt current and increases V oc and FF for the mixed-phase solar cells (cell 11 and cell 13) [8], but does not show an effect on the cell with a fully amorphous signature (cell 23). region appears [9][10][11]. After light soaking, the light-induced V oc increase was observed in both the cells with no buffer layer and with a 100 Å thick buffer layer, but was not observed in the cells with a 500 Å thick buffer.…”
Section: Experimental and Resultsmentioning
confidence: 93%
“…shows four typical groups of data obtained at 13.6, 19.7, 40, and 60 K. The straight lines are linear best fits to the data. Since the I PL and excitation density P can be related as [16] I PL ∝ P Z , (…”
Section: Resultsmentioning
confidence: 99%