Characteristics of triode magnetron sputtering: the morphology of deposited titanium films

Molhabilidade e atividade fotocatalítica de filmes finos de TiOx depositados por magnetron sputtering em diferentes pressões parciais de O2

“…Antes da deposição as amostras foram limpas com álcool isopropílico em ultrassom. Os filmes foram depositados em um sistema dc triodo magnetron sputtering (9,10) . A câmara de deposição foi evacuada até uma pressão base em torno de 2.10 -5 Torr através de um sistema de vácuo constituído de uma bomba mecânica e uma bomba turbomolecular.…”

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

“…Junga et al [3] deposited Ti thin films with grid-attached magnetron sputtering in which the substrate bias of 150 V was applied. Fontana et al [1] prepared Ti thin films by triode magnetron sputtering at substrate temperature of 100°C and substrate bias of 300 V. Golan et al [13] deposited Ti thin films using triode sputtering by biasing the substrate and at substrate temperature of 50°C.…”

“…By lowering the working pressure, the mean free path of the atoms/molecules can be increased which, in turn, leads to less loss of energy of the arrival atoms due to reduced number of collisions. This will influence surface morphology and crystalline structure of the deposited film [1]. The increasing substrate temperature results in an increase in the kinetic energy of adatoms, and high film density [2].…”

Radar absorbing materials based on titanium thin film obtained by sputtering technique

“…Titanium thin films were deposited on commercial polyethylene terephthalate (PET) substrates, with 0.1 mm of thickness, using the triode magnetron sputtering (TMS) technique, based on the TMS equipment presented by Fontana and Muzart (1998). The present process differs from the conventional magnetron sputtering, due to the presence of a screen parallel to the target, 2.0 cm from it.…”