Characteristics of W‐C‐N thin films on Si as a role of diffusion barrier for La0.67Sr0.33MnO3 manganese oxide layer

Kim, Soo In; Lee, Chang Woo

doi:10.1002/pssc.200777240

Cited by 1 publication

(1 citation statement)

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“…This analysis is somewhat consistent with WCN formation using a much lower N 2 partial pressure during sputtering. 57 From the fitting of the high resolution XPS spectra (not shown), the C1s have three possible states at 284.9 eV, 283.6 eV, and 282.3 eV. The state at 284.9 eV is consistent with sp 2 -bonded C within the film.…”

Section: Resultsmentioning

confidence: 89%

Sputtered Tungsten-Based Ternary and Quaternary Layers for Nanocrystalline Diamond Deposition

Walock¹,

Rahil²,

Zou³

et al. 2012

j. nanosci. nanotech.

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. Many of today's demanding applications require thin-film coatings with high hardness, toughness, and thermal stability. In many cases, coating thickness in the range 2-20 m and low surface roughness are required. Diamond films meet many of the stated requirements, but their crystalline nature leads to a high surface roughness. Nanocrystalline diamond offers a smoother surface, but significant surface modification of the substrate is necessary for successful nanocrystalline diamond deposition and adhesion. A hybrid hard and tough material may be required for either the desired applications, or as a basis for nanocrystalline diamond film growth. One possibility is a composite system based on carbides or nitrides. Many binary carbides and nitrides offer one or more mentioned properties. By combining these binary compounds in a ternary or quaternary nanocrystalline system, we can tailor the material for a desired combination of properties. Here, we describe the results on the structural and mechanical properties of the coating systems composed of tungstenchromium-carbide and/or nitride. These WC-Cr-(N) coatings are deposited using magnetron sputtering. The growth of adherent nanocrystalline diamond films by microwave plasma chemical vapor deposition has been demonstrated on these coatings. The WC-Cr-(N) and WC-Cr-(N)-NCD coatings are characterized with atomic force microscopy and SEM, X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy, and nanoindentation.

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Section: Resultsmentioning

confidence: 89%