Characteristics of YBa2Cu3O7−x/SrTiO3/YBa2Cu3O7−x films formed by chemical solution deposition

One step preparation of photosensitive Bi2Sr2CaCu2O8+x films and their fine patterns by a photosensitive sol–gel method

“…In recent years, much effort has been put into the development of the fine-patterning technology of films by our research group, and a photosensitive sol-gel method has progressed. This method provides a new fine-patterning method for the high-T c superconducting films that are applied in superconducting microelectronic devices [6][7][8]. Compared with some traditional fine-patterning methods such as wet chemical etching [9], focused ion beam [10,11], laser patterning [12,13], and high energy ion irradiation [14], the photosensitive sol-gel method dramatically reduces surface damage and property degradation resulting from ion beam or etching agent, and realizes the integration and high-efficiency of a microstructure.…”