Characterization and leakage current density of radio frequency magnetron sputtered nanocrstalline SrTiO3 thin films

Effect of O2/Ar flow ratio and post-deposition annealing on the structural, optical and electrical characteristics of SrTiO3 thin films deposited by RF sputtering at room temperature

“…Furthermore, in nanostructured thin film form they have ability to show multifunctional properties [18]. STO nanostructured thin films have been deposited on a variety of substrates using various deposition techniques including electron cyclotron resonance (ECR) ion beam sputtering [19], atomic layer deposition [20], pulsed laser deposition [21,22], molecular beam epitaxy [23], metal organic chemical vapor deposition [24], and sputtering [1,[25][26][27]. Among these methods, sputtering is simple, low cost and effective thin film growth technique which is compatible for industrial scale as well.…”

Structural characteristics of SrTiO3 thin films processed by rapid thermal annealing

“…The thickness dependence of electric properties such as dielectric constant for STO thin films has been reported [11][12][13]. However, the grain size also has effect on electric properties [14] though has not been studied in detail.…”

Preparation and characterization of SrTiO3/BaTiO3 thin multilayer films deposited on Pt/Ti/SiO2/Si substrate by radio frequency magnetron sputtering

“…The internal stress at the interface between ST and BT affects the FWHM of reflections. On the other hand, when ST and BT films with thickness 450.0 nm, the crystallite size only about 40.0 [15] and 45.0 nm [16], respectively. This factor also affects the FWHM.…”