Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Yanagida, Takeshi; Nagano, Hitoshi; Wada, Y.; Yabu, Takayuki; Nagai, Shinji; Soumagne, Georg; Hori, Tsukasa; Kakizaki, Kouji; Sumitani, Akira; Fujimoto, Junichi; Mizoguchi, Hideaki; Endo, Akira

doi:10.1117/12.879189

Cited by 13 publications

(8 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Also, some neutral atoms can be guided and trapped by charge exchange with ions. 11) This system is also equipped with a chemical etching mechanism. With this etching mechanism the remaining Sn atoms are removed from the surface of the collector mirror and of some view ports.…”

Section: 1mentioning

confidence: 99%

Performance of one hundred watt HVM LPP-EUV source

Mizoguchi¹,

Nakarai²,

Abe³

et al. 2015

SPIE Proceedings

Self Cite

View full text Add to dashboard Cite

We have been developing CO 2 -Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies such as: combination of pulsed CO 2 laser and Sn droplets, dual wavelength laser pulses shooting, and mitigation with magnetic field, have been developed in Gigaphoton Inc. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. Based on these data we are developing first practical source for HVM: "GL200E". This data means 250W EUV power will be able to realize around 20kW level pulsed CO 2 laser. We have reported engineering data from our recent test such around 43W average clean power, CE=2.0%, with 100kHz operation and other data 19) . We have already finished preparation of higher average power CO 2 laser more than 20kW at output power cooperate with Mitsubishi Electric Corporation 14) . Recently we achieved 92W with 50kHz, 50% duty cycle operation 20) . We have reported component technology progress of EUV light source system.We report promising experimental data and result of simulation of magnetic mitigation system in Proto #1 system. We demonstrated several data with Proto #2 system: (1) emission data of 140W in burst under 70kHz 50% duty cycle during 10 minutes. (2) emission data of 118W in burst under 60kHz 70% duty cycle during 10 minutes. (3) emission data of 42W in burst under 20kHz 50% duty cycle (10000pls/0.5ms OFF) during 3 hours (110Mpls). Also we report construction of Pilot #1 system. Final target is week level operation with 250W EUV power with CE=4%, more than 27kW CO 2 laser power by the end of Q2 of 2015.

show abstract

Section: 1mentioning

confidence: 99%

Performance of one hundred watt HVM LPP-EUV source

Mizoguchi¹,

Nakarai²,

Abe³

et al. 2015

SPIE Proceedings

Self Cite

View full text Add to dashboard Cite

show abstract

“…Also, some neutral atoms can be guided and trapped by charge exchange with ions. 11) In reality, however, not all the Sn atoms and ions can be trapped in the magnetic field. Accordingly, our system is also equipped with a chemical etching mechanism.…”

Section: Droplet Generation and Magnetic Mitigation Technologymentioning

confidence: 99%

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Mizoguchi¹,

Nakarai²,

Abe³

et al. 2014

SPIE Proceedings

Self Cite

View full text Add to dashboard Cite

Since 2002, we have been developing a CO 2 -Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma. Our group has proposed several unique original technologies; 1) CO 2 laser driven Sn plasma generation, 2) Double laser pulse shooting for higher Sn ionization rate and higher CE. 3) Sn debris mitigation with a magnetic field, 4) Hybrid CO 2 laser system that is scalable with a combination of a short pulse oscillator and commercial cw-CO 2 amplifiers. 5) High efficient out of band light reduction with grating structured C1 mirror. In past paper we demonstrated in small size (2Hz) experimental device, this experiment shoed the advantage of combining a laser beam at a wavelength of the CO 2 laser system with Sn plasma to achieve high CE>4.7% (in maximum) from driver laser pulse energy to EUV in-band energy 1) . In this paper we report the further updated results from last paper. (1) 20um droplets at 100kHz operation was successfully ejected by downsized nozzle and demonstrated dramatical improvement of debris on the collector mirror. We have been developing extension of high CE operation condition at 20kHz range, We have reported component technology progress of EUV light source system. (2)New generation collector mirror with IR reduction technology is equipped in mirror maker. (3)20kW CO 2 laser amplifier system is demonstrated cooperate with Mitsubishi electric. (4) We develop new Proto #2 EUV LPP source system and demonstrated 200W EUV plasma power (43W EUV clean power at I/F ) at 100kHz operation was confirmed. (5) High conversion efficiency (CE) of 3.9% at 20kHz operation was confirmed in using pico-second pre-pulse laser. (6)Improvement of CO 2 laser power from 8kW to 12kW is now on going by installation of new pre-amplifier. (7)Power-up scenario of HVM source is reported, target shipment of first customer beta LPP light source unit is 2015.

show abstract

“…We have investigated EUV plasma generation scheme with the use of the small experimental tool operated at the repetition rate of 10 Hz (maximum). Figure 2 shows the experimental setup for the basic investigation of EUV light generation and Sn debris mitigation [5][6][7].…”

Section: Lpp Euv Light Source Equipment Configurationsmentioning

confidence: 99%

“…beam and/or a CO 2 laser (wavelength 10.6 µm) beam, the Sn droplet in the vessel is converted into a plasma emitting EUV where several states of Sn exist simultaneously [6,7]. Sn present during plasma generation is generally classified in three categories: fragments, neutral atoms, or ions.…”

Section: Double-pulse Laser Irradiation When a Sn Droplet Target Is mentioning

confidence: 99%

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Fujimoto¹,

Hori²,

Yanagida³

et al. 2012

Physics Research International

Self Cite

View full text Add to dashboard Cite

Since 2002, we have been developing a carbon dioxide (CO 2 ) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing. EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma. We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use. We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO 2 laser energy absorption rate. The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE). We focus on prepulsed laser pulsed duration. When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE

show abstract

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Cited by 13 publications

References 0 publications

Performance of one hundred watt HVM LPP-EUV source

Performance of one hundred watt HVM LPP-EUV source

Sub-hundred Watt operation demonstration of HVM LPP-EUV source

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Contact Info

Product

Resources

About