2005
DOI: 10.1016/j.jcrysgro.2005.02.035
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Characterization and Raman investigations on high-quality ZnO thin films fabricated by reactive electron beam evaporation technique

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Cited by 73 publications
(29 citation statements)
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“…As shown in Fig. 7, the Raman peaks located at 433 cm À1 have been assigned to optical phonons E 2 (high) mode of wurtzite structure ZnO [33][34][35]. But the Raman frequency of E 2 (high) mode shifts towards the lower frequency side, which results from residual stress and lattice disorder [10] accompanied by the introduction of La.…”
Section: Article In Pressmentioning
confidence: 95%
“…As shown in Fig. 7, the Raman peaks located at 433 cm À1 have been assigned to optical phonons E 2 (high) mode of wurtzite structure ZnO [33][34][35]. But the Raman frequency of E 2 (high) mode shifts towards the lower frequency side, which results from residual stress and lattice disorder [10] accompanied by the introduction of La.…”
Section: Article In Pressmentioning
confidence: 95%
“…Especially, as the UV emitting material, with the band gap of 3.6 eV and large exciton binding energy (60 meV) at room temperature, ZnO thin films have drawn much attention among the researchers [5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…The absence of Si/Ge vibration peaks about 400 cm −1 corresponds to the Si/Ge alloy mode [17] implies there is no intermixing of Si from the substrate with GIs. The higher peak at 520 cm −1 is attributed to the optical phonon mode of the Si substrate [18]. The optical band gap (Eg) for GI lms were determined by analyzing the optical data, with the expression of the optical absorbance α and the incident photon energy hν, using the Tauc equation [19].…”
Section: Resultsmentioning
confidence: 99%