2002
DOI: 10.1016/s0925-9635(02)00103-6
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Characterization of boron doped CVD diamond films by Raman spectroscopy and X-ray diffractometry

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Cited by 32 publications
(13 citation statements)
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“…23,24 Finally, the influence of the boron acceptor on the structural and optoelectronic properties of the diamond films were investigated for single and polycrystalline diamond films. 21,22,[26][27][28][29][30][31] However, the same sort of detailed investigation is still missing for boron-doped NCD films. As it has been discussed for polycrystalline diamond films 22 and UNCD films, 32 it is essential to understand the influence of the grain boundaries on the optical properties of NCD and the role they play in the electronic transport.…”
Section: Introductionmentioning
confidence: 99%
“…23,24 Finally, the influence of the boron acceptor on the structural and optoelectronic properties of the diamond films were investigated for single and polycrystalline diamond films. 21,22,[26][27][28][29][30][31] However, the same sort of detailed investigation is still missing for boron-doped NCD films. As it has been discussed for polycrystalline diamond films 22 and UNCD films, 32 it is essential to understand the influence of the grain boundaries on the optical properties of NCD and the role they play in the electronic transport.…”
Section: Introductionmentioning
confidence: 99%
“…For the production of diamond and DLC coatings with vapor deposition processes, it is believed that substrate temperature and bias, gas type and flow rate, and substrate material are predominant parameters in determining the structure, morphological characteristics, and residual stress level of the coatings. [2][3][4][5][6] It was reported that direct current plasma jet ͑DCPJ͒ diamond coatings had an internal stress gradient along the radial direction of sample surface. 7 The internal stress of microwave chemical-vapor-deposited ͑MWCVD͒ diamond coatings was also investigated.…”
Section: Introductionmentioning
confidence: 99%
“…The diamond films were grown on monocrystalline silicon (111) by hot filament CVD in a 10-cm-diameter, 30 cm long cylindrical quartz reactor [10]. Boron was introduced into the reactor by flowing hydrogen through the B 2 O 3 methanol solution.…”
Section: Methodsmentioning
confidence: 99%