2013
DOI: 10.1016/j.jssc.2013.02.002
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Characterization of carrier states in CuWO4 thin-films at elevated temperatures using conductometric analysis

Abstract: /npsi/ctrl?lang=en http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/ctrl?lang=fr Access and use of this website and the material on it are subject to the Terms and Conditions set forth at http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/jsp/nparc_cp.jsp?lang=en NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépubli… Show more

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Cited by 4 publications
(3 citation statements)
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References 62 publications
(61 reference statements)
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“…For the preparation of films, the most investigated methods are electrodeposition [20] pulsed laser deposition [21], hydrothermal synthesis [22], sputtering deposition [23], and spray pyrolysis [24]. In general, the use of semiconductor oxide films in photocatalytic processes benefits from the porous structure of the films, which allows a better diffusion of the electrolyte and facilitates catalyst removal from the reaction medium after the catalytic process [25].…”
Section: Introductionmentioning
confidence: 99%
“…For the preparation of films, the most investigated methods are electrodeposition [20] pulsed laser deposition [21], hydrothermal synthesis [22], sputtering deposition [23], and spray pyrolysis [24]. In general, the use of semiconductor oxide films in photocatalytic processes benefits from the porous structure of the films, which allows a better diffusion of the electrolyte and facilitates catalyst removal from the reaction medium after the catalytic process [25].…”
Section: Introductionmentioning
confidence: 99%
“…Electrodeposition [14,21] Thermal conversion [39,40] Sol-gel method [26,29,35] Hydrothermal [25] Electrodeposition (J ph 0.2 mA/cm 2 at 1.23 V RHE ) [21] ALD [30] Thermal conversion (J ph 0.33 mA/cm 2 at 1.23 V RHE ) [24] CVD [23] Ultrasonic spray pyrolysis [28] Impulse magnetron co-sputtering [32] PLD [31] Sol-gel (J ph 0.5mA/cm 2 Mo 6+ [44] Mo solid solution Mo 6+ [45][46][47][48] Red shift of photoresponse (from 550 nm to 600 nm) [45] CuW 0.35 Mo 0.65 O 4 /FTO (J ph 1.0 mA/cm 2 at 1.23 V RHE for SA oxidation) [46] Heterojunction and electron transfer layer WO 3 (flat) [49] WO 3 (nanorod) [39] WO 3 (urchin like) [50] SnO 2 [26] BiVO 4 [51] CuWO 4 /flat WO 3 /FTO. ~4 times increment (J ph 0.55 mA/cm 2 at 1.23 V RHE ) [49] Electrocatalyst Co-Pi [26,52,53] Co 3 O 4 [18] FeCoO x [54] MnPO 4 [55] NiWO 4 [56] NiFeO x [57] P-type sulfide (MoS 2 , NbS 2 , NiS x ) [44] MnNCN [58] Ni-Pi [59] Ag [60] Co-Pi/CuWO 4 /FTO, 30% increment (J ph 0.4 mA/cm 2 at 0.6 V Ag/AgCl ) [52] IrCo-Pi [61] Post-treatment H 2 treatment…”
Section: Synthesis Methodsmentioning
confidence: 99%
“…C. M. Gonzalez et al [31] proposed pulsed laser deposition (PLD) onto an insulating substrate for synthesizing CuWO 4 thin films. They investigated the temperature dependence of electronic conductivity for CuWO 4 films across the 100-500 • C temperature range.…”
Section: Synthesis Of Cuwo 4 Thin Filmmentioning
confidence: 99%